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公开(公告)号：EP3203316B1
公开(公告)日：2018-06-06
申请号：EP17151187.6
申请日：2015-04-09
CPC分类号： G02B27/0101 , B60R1/001 , B60R2001/1215 , G02B5/0284 , G02B5/124 , G02B27/0172 , G02B2027/0196 , G03B21/62
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公开(公告)号：EP3203316A1
公开(公告)日：2017-08-09
申请号：EP17151187.6
申请日：2015-04-09
CPC分类号： G02B27/0101 , B60R1/001 , B60R2001/1215 , G02B5/0284 , G02B5/124 , G02B27/0172 , G02B2027/0196 , G03B21/62
摘要： L'invention concerne un écran (204) comportant des portions transparentes (513) et des portions rétroréfléchissantes (511) réparties sur tout ou partie de sa surface.
摘要翻译： 本发明涉及一种屏幕（204），其包括分布在其全部或部分表面上的透明部分（513）和逆向反射部分（511）。
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23.发明公开PROCEDE DE LITHOGRAPHIE D'UNE IMAGE PAR ECRITURE DIRECTE CONTINUE 审中-公开METHOD FOR IMAGE光刻能够通过连续直接写作
公开(公告)号：EP2193403A1
公开(公告)日：2010-06-09
申请号：EP08787562.1
申请日：2008-08-28
发明人： MARTINEZ, Christophe
IPC分类号： G03F7/20
CPC分类号： G03F7/70383
摘要： The invention relates to lithography techniques and more particularly to template-free lithography in which a pattern is directly written on a substrate using an energetic beam, typically a laser beam. According to the invention, the position of the beam is moved according to a continuous movement relative to the surface of the substrate, and the beam is switched on or off depending on the pattern to be written on the substrate. The pattern is such that the smallest width of the areas to be radiated is larger than the smallest width (L, L1) of the areas (8) that must be radiated. The active diameter (D) of the radiation beam is larger than the latter. The diameter is defined based on the depth of the resin to be exposed and is a compromise between the need or depth exposure and the size of the patterns to be written. It is thus possible to achieve a resolution higher than that theoretically possible with the beam diameter, even for resins having a thickness which is much higher than the size of the finest patterns to be produced.
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