公开(公告)号：EP2454080B1

公开(公告)日：2013-12-18

申请号：EP11724143.0

申请日：2011-05-16

申请人： Dws S.R.L.

发明人： BUSATO, Renzo

IPC分类号： B29C67/00

CPC分类号： B29C67/0066 ,  B29C64/135 ,  B29C64/20 ,  B33Y40/00

摘要： Stereolithography machine (1) comprising: a supporting frame (2); a tank (3) suited to contain a liquid substance; a supporting plate (4) associated with the supporting frame (2), suited to support the tank (3); a stopping unit (5) suited to firmly hold the tank (3) on the supporting plate (4) in a resting position; emitter means (6) suited to direct a predefined electromagnetic radiation (6a) towards the tank (3); a holding unit (7) of the tank (3) operatively associated with the supporting plate (4) through first actuator means (8) configured so as to move the tank (3) with respect to the supporting plate (4) according to a predefined trajectory of movement. The stopping unit (5) comprises second actuator means (17) that define for the stopping unit (5) an active configuration for holding the tank (3) and a rest configuration for releasing the tank (3).

公开(公告)号：EP2461963A2

公开(公告)日：2012-06-13

申请号：EP10749620.0

申请日：2010-08-03

申请人： Dws S.R.L.

发明人： ZENERE, Sergio

IPC分类号： B29C67/00

CPC分类号： B29C67/0066 ,  B29C64/135 ,  B29C64/20 ,  B29C64/386

摘要： The invention is a stereolithography machine (1) comprising the following: a container (3) suited to contain a fluid substance and comprising a transparent bottom (3a); a support plate (2) provided with a hole (2a) and designed to house the container (3) so that the transparent bottom (3a) faces the hole (2a); a radiation source (4) arranged below the support plate (2) and suited to convey a radiation beam towards the transparent bottom (3a) through the hole (2a); a temperature control unit (5) suited to maintain the support plate (2) at a predetermined temperature.

公开(公告)号：EP2454080A1

公开(公告)日：2012-05-23

申请号：EP11724143.0

申请日：2011-05-16

申请人： Dws S.R.L.

发明人： BUSATO, Renzo

IPC分类号： B29C67/00

CPC分类号： B29C67/0066 ,  B29C64/135 ,  B29C64/20 ,  B33Y40/00

摘要： Stereolithography machine (1) comprising: a supporting frame (2); a tank (3) suited to contain a liquid substance; a supporting plate (4) associated with the supporting frame (2), suited to support the tank (3); a stopping unit (5) suited to firmly hold the tank (3) on the supporting plate (4) in a resting position; emitter means (6) suited to direct a predefined electromagnetic radiation (6a) towards the tank (3); a holding unit (7) of the tank (3) operatively associated with the supporting plate (4) through first actuator means (8) configured so as to move the tank (3) with respect to the supporting plate (4) according to a predefined trajectory of movement. The stopping unit (5) comprises second actuator means (17) that define for the stopping unit (5) an active configuration for holding the tank (3) and a rest configuration for releasing the tank (3).

摘要翻译： 立体光刻机（1），包括：支撑框架（2）; 适于容纳液体物质的罐（3）; 与所述支撑框架（2）相关联的支撑板（4），其适于支撑所述罐（3）; 停止单元（5），其适于在静止位置牢固地将所述罐（3）保持在所述支撑板（4）上; 发射装置（6），适于将预定的电磁辐射（6a）引向所述罐（3）; 通过第一致动器装置（8）可操作地与支撑板（4）相关联的罐（3）的保持单元（7），其构造成根据 预定的运动轨迹。 止动单元（5）包括第二致动器装置（17），其限定止动单元（5）用于保持储罐（3）的活动构型和用于释放储罐（3）的休止构型。