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公开(公告)号：EP0799906B1
公开(公告)日：2002-07-03
申请号：EP97302304.7
申请日：1997-04-03
发明人： Paranjpe, Ajit P.
CPC分类号： H01L21/28556 , C23C16/12 , C23C16/20
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公开(公告)号：EP0605205B1
公开(公告)日：1999-08-11
申请号：EP93310470.5
申请日：1993-12-23
发明人： Asaba, Tetsuo, c/o Canon Kabushiki Kaisha , Kawasumi, Yasushi, c/o Canon Kabushiki Kaisha , Ohmi, Kazuaki, c/o Canon Kabushiki Kaisha , Sekine Yasuhiro, c/o Canon Kabushiki Kaisha , Hayakawa, Yukihiro, c/o Canon Kabushiki Kaisha
CPC分类号： C23C16/4487 , C23C16/045 , C23C16/20 , C23C16/4482 , H01L21/02381 , H01L21/02532 , H01L21/0262 , H01L21/02639 , H01L21/28562 , Y10S261/65
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公开(公告)号：EP0605205A1
公开(公告)日：1994-07-06
申请号：EP93310470.5
申请日：1993-12-23
发明人： Asaba, Tetsuo, c/o Canon Kabushiki Kaisha , Kawasumi, Yasushi, c/o Canon Kabushiki Kaisha , Ohmi, Kazuaki, c/o Canon Kabushiki Kaisha , Sekine Yasuhiro, c/o Canon Kabushiki Kaisha , Hayakawa, Yukihiro, c/o Canon Kabushiki Kaisha
CPC分类号： C23C16/4487 , C23C16/045 , C23C16/20 , C23C16/4482 , H01L21/02381 , H01L21/02532 , H01L21/0262 , H01L21/02639 , H01L21/28562 , Y10S261/65
摘要： A chemical vapor deposition apparatus comprises a starting material container (106) holding a starting material in a liquid state, a starting gas generating container (102) into which the liquid starting material is fed from the starting material container, a means (103) for keeping constant the liquid level of the liquid starting material held in the starting gas generating container, a means for injecting a bubbling gas (105) from the outside into the liquid starting material held in the starting gas generating container, thereby bubbling the starting gas, and a reaction chamber (101) into which a mixed gas of the starting gas and the bubbling gas are fed.
摘要翻译： 一种化学气相沉积装置，包括：保持液态起始材料的原料容器（106），起始气体发生容器（102），液体起始材料从原料容器供给到该起始气体发生容器;一个装置，用于 保持保持在起动气体发生容器中的液体起始材料的液面不变，将来自外部的鼓泡气体（105）注入保持在起始气体发生容器中的液体起始材料中的装置，从而使起始气体起泡， 和反应室（101），其中供给起始气体和鼓泡气体的混合气体。
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