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公开(公告)号：EP1738225A2
公开(公告)日：2007-01-03
申请号：EP05718269.3
申请日：2005-03-23
发明人： SUI, Yu c/o Clariant (Japan) k. k. , WU, Hengpeng , KANG, Wenbing c/o Clariant (Japan) k. k. , NEISSER, Mark, O. , KATAYAMA, Tomohide c/o Clariant (Japan) K. K. , DING-LEE, Shuji, S. , HISHIDA, Aritaka , OBERLANDER, Joseph, E. , TOUKHY, Medhat, A.
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
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公开(公告)号：EP2493991A1
公开(公告)日：2012-09-05
申请号：EP10796469.4
申请日：2010-10-29
发明人： YAO, Huirong , LIN, Guanyang , NEISSER, Mark, O.
IPC分类号： C09D167/00 , G03F7/09
CPC分类号： C09D167/02 , C08G63/16 , G03F7/091
摘要： The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, (Formula I) (I) where, X is a linking moiety selected from a nonaromatic (A) moiety, aromatic (P) moiety and mixture thereof, R' is a group of structure (2), R" is independently selected from hydrogen, a moiety of structure (2), Z and W-OH, where Z is a (Cr C
20 ) hydrocarbyl moiety and W is a (C
1 -C
20 ) hydrocarbylene linking moiety, and, Y' is independently a (C
1 -C
20 ) hydrocarbylene linking moiety, where structure (2) is (Formula II) (II) where R1 and R2 are independently selected from H and C
1 C
4 alkyl and L is an organic hydrocarbyl group. The invention further relates to a process for imaging the antireflective coating composition.-
公开(公告)号：EP2212273A2
公开(公告)日：2010-08-04
申请号：EP08843074.9
申请日：2008-10-21
发明人： HOULIHAN, Francis, M. , MIYAZAKI, Shinji , NEISSER, Mark, O. , DIOSES, Alberto, D. , OBERLANDER, Joseph, E.
IPC分类号： C07C55/02 , C07C211/03 , G03F7/004 , G03F7/11
CPC分类号： C07C211/05 , C07C55/08 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/091 , G03F7/095
摘要： Multilayer systemcomprising at least a first layer containing a photoacid generator substantially in soluble in a solvent of a second layer and in an optional third layer present in the system. Positive and negative developable bottom antiref lective coating compositions and coated substrate comprising a substrate, a layer of said antiref lective coating composition and a positive or negative photoresist composition. A process for forming an image. A compound of formula (I) HA+ (I).
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公开(公告)号：EP2035518A2
公开(公告)日：2009-03-18
申请号：EP07734993.4
申请日：2007-06-20
发明人： ZHANG, Ruzhi , NEISSER, Mark, O. , KIM, Woo-Kyu , ABDALLAH, David, J. , HOULIHAN, Francis , LU, Ping-Hung , ZHUANG, Hong
IPC分类号： C09D183/04 , H01L21/312
CPC分类号： C09D183/04 , G03F7/038 , G03F7/0757 , G03F7/091 , H01L21/02126 , H01L21/02216 , H01L21/02282
摘要： The present invention relates to a novel antireflective coating composition for forming an underlayer for a photoresist comprising an acid generator and a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1), where m is 0 or 1, W and W are independently a valence bond or a connecting group linking the cyclic ether to the silicon of the polymer and L is selected from hydrogen, W and W, or L and W are combined to comprise a cycloaliphatic linking group linking the cyclic ether to the silicon of the polymer. The invention also relates to a process for imaging the photoresist coated over the novel antireflective coating composition and provides good lithographic results. The invention further relates to a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1).
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公开(公告)号：EP1465877B1
公开(公告)日：2008-09-24
申请号：EP03706347.6
申请日：2003-01-03
发明人： OBERLANDER, Joseph, E. , DAMMEL, Ralph, R. , DING-LEE, Shuji , NEISSER, Mark, O. , TOUKHY, Medhat, A.
IPC分类号： C07D239/91 , A61K31/5025 , A61K31/505 , A61P29/00 , C07D401/06 , C07D401/10 , C07D401/12 , C07D471/04 , C07D239/00 , C07D221/00 , C07D233/00 , C07D257/00
CPC分类号： G03F7/09 , G03F7/0392 , G03F7/091 , Y10S430/106
摘要： The present invention relates to a novel absorbing, photoimageable and aqueous developable positive-working antireflective coating composition comprising a photoacid generator and a polymer comprising at least one unit with an acid labile group and at least one unit with an absorbing chromophore. The invention further relates to a process for using such a composition. The present invention also relates to a novel absorbing, photoimageable and aqueous alkali developable positive-working antireflective coating composition comprising a polymer comprising at least one unit with an acid labile group, a dye and a photoacid generator. The invention further relates to a process for using such a composition. The invention also relates to a novel process for forming a positive image with a positive photoresist and a novel photoimageable and aqueous developable positive-working antireflective coating composition, where the antireflective coating comprises a polymer comprising an acid labile group. The invention further relates to such a composition. The invention also relates to a process for imaging a photoimageable antireflective coating composition.
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6.发明公开
公开(公告)号：EP1849039A2
公开(公告)日：2007-10-31
申请号：EP06710463.8
申请日：2006-02-09
发明人： ABDALLAH, David, J. , NEISSER, Mark, O. , DAMMEL, Ralph, R. , PAWLOWSKI, Georg , BIAFORE, John , ROMANO, Andrew, R. , KIM, Wookyu
IPC分类号： G03F7/09
CPC分类号： G03F7/091 , Y10S430/151
摘要： A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; c) imagewise exposing the photoresist with an exposure equipment; and, d) developing the coating with a developer.
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公开(公告)号：EP2723809A1
公开(公告)日：2014-04-30
申请号：EP12732870.6
申请日：2012-06-18
发明人： YAO, Huirong , LIN, Guanyang , BOGUSZ, Zachary , LU, PingHung , KIM, Woo-Kyu , NEISSER, Mark, O.
摘要： The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.
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8.发明公开ANTIREFLECTIVE COATING COMPOSITION AND PROCESS FOR MANUFACTURING MICROELECTRONIC DEVICE 有权ANTI REFLEX涂料组合物及其制备方法的微电子器件
公开(公告)号：EP2577361A1
公开(公告)日：2013-04-10
申请号：EP11733906.9
申请日：2011-06-01
CPC分类号： G03F7/091 , G02B1/04 , G02B1/111 , G03F7/0046 , C08L33/16 , C08L33/24 , C08L33/066 , C08L61/20 , C08L79/08
摘要： The invention relates to an antireflective coating comprising a mixture of a first polymer and a second polymer, and a thermal acid generator, where the first polymer comprises at least one fluoroalcohol moiety, at least one aliphatic hydroxyl moiety, and at least one acid moiety other than fluoroalcohol with a pKa in the range of about 8 to about 11; where the second polymer is a reaction product of an aminoplast compound with a compound comprising at least one hydroxyl and/or at least one acid group. The invention further relates to a process for using the novel composition to form an image.
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公开(公告)号：EP2483745A1
公开(公告)日：2012-08-08
申请号：EP09764034.6
申请日：2009-11-12
发明人： PADMANABAN, Munirathna , CHAKRAPANI, Srinivasan , HOULIHAN, Francis, M. , MIYAZAKI, Shinji , NG, Edward, W. , NEISSER, Mark, O.
IPC分类号： G03F7/09
CPC分类号： G03F7/091
摘要： The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solublilty of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.
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公开(公告)号：EP1751210A1
公开(公告)日：2007-02-14
申请号：EP05718352.7
申请日：2005-03-31
发明人： WU, Hengpeng , SHAN, Jianhui , DING-LEE, Shuji, Sue , XIANG, Zhong , GONZALEZ, Eleazor, B. , NEISSER, Mark, O.
CPC分类号： C08J7/047 , C08G63/46 , C08G63/916 , C08J2383/00 , C08J2467/00 , Y10T428/31504 , Y10T428/31786
摘要： The present invention relates to a process for making a polyester where a dianhydride is reacted with a diol. The resulting polyester can be further reacted with a compound selected from aromatic oxides, aliphatic oxides, alkylene carbonates, alcohols, and mixtures thereof.
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