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公开(公告)号:EP4127254A1
公开(公告)日:2023-02-08
申请号:EP21712876.8
申请日:2021-03-23
申请人: BASF SE
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公开(公告)号:EP3384063A1
公开(公告)日:2018-10-10
申请号:EP16808948.0
申请日:2016-11-30
发明人: ADERMANN, Torben , LOEFFLER,Daniel , WILMER, Hagen , SCHIERLE-ARNDT, Kerstin , GERKENS, Jan , VOLKMANN, Christian , SCHNEIDER, Sven
IPC分类号: C23C16/18 , C23C16/455 , C07F13/00 , C07F15/04 , C07F15/06
CPC分类号: C07F15/065 , C01B33/06 , C09D1/00 , C09D5/021 , C23C16/18 , C23C16/45525 , C23C16/45553 , H01L21/28518 , H01L21/28556 , H01L21/76841
摘要: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is Mn, Ni or Co, X is a ligand which coordinates M, n is 0, 1, or 2, R1, R2 are an alkyl group, an alkenyl group, an aryl group or a silyl group, m is 1, 2, or 3, R3, R4, and R5 are an alkyl group, an alkenyl group, an aryl group, an alkoxy group, or an aryloxy group, and p is 1, 2 or 3.
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公开(公告)号:EP4004246A1
公开(公告)日:2022-06-01
申请号:EP20743707.0
申请日:2020-07-24
申请人: BASF SE
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公开(公告)号:EP4004245A1
公开(公告)日:2022-06-01
申请号:EP20742783.2
申请日:2020-07-24
申请人: BASF SE
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公开(公告)号:EP3887557A1
公开(公告)日:2021-10-06
申请号:EP19801592.7
申请日:2019-11-18
申请人: BASF SE
发明人: ROHDE, Wolfgang , ADERMANN, Torben , GERKE, Birgit
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公开(公告)号:EP4004244A1
公开(公告)日:2022-06-01
申请号:EP20742778.2
申请日:2020-07-24
申请人: BASF SE
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公开(公告)号:EP3729554A1
公开(公告)日:2020-10-28
申请号:EP18812182.6
申请日:2018-12-10
申请人: BASF SE
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公开(公告)号:EP3380644B1
公开(公告)日:2019-08-21
申请号:EP16798703.1
申请日:2016-11-18
申请人: BASF SE
发明人: ADERMANN, Torben , LOEFFLER, Daniel , LIMBURG, Carolin , ABELS, Falko , WILMER, Hagen , GILL, Monica , GRIFFITHS, Matthew , BARRY, Séan
IPC分类号: C23C16/18 , C07F13/00 , C07F15/04 , C07F15/06 , C23C16/455
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