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公开(公告)号：EP4170693A1
公开(公告)日：2023-04-26
申请号：EP22212478.6
申请日：2021-03-25
Applicant: FEI Company
Inventor： Henstra, Alexander , Deng, Yuchen , Kohr, Holger
Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.
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公开(公告)号：EP4318546A3
公开(公告)日：2024-04-24
申请号：EP23206141.6
申请日：2021-03-25
Applicant: FEI Company
Inventor： Henstra, Alexander , Deng, Yuchen , Kohr, Holger
CPC classification number: H01J2237/261420130101 , H01J37/04 , H01J37/26 , H01J2237/049220130101 , H01J2237/1520130101
Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.
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公开(公告)号：EP3901980A3
公开(公告)日：2021-12-22
申请号：EP21164759.9
申请日：2021-03-25
Applicant: FEI Company
Inventor： Henstra, Alexander , Deng, Yuchen , Kohr, Holger
Abstract: Methods for using a single electron microscope system for investigating a sample with TEM and STEM techniques include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam that is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the STEM beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image and a STEM image.
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公开(公告)号：EP3923314A1
公开(公告)日：2021-12-15
申请号：EP21178118.2
申请日：2021-06-08
Applicant: FEI Company
Inventor： Deng, Yuchen , Trompenaars, Piet , Buijsse, Bart , Henstra, Alexander
IPC: H01J37/30
Abstract: Methods for using a dual beam microscope system to simultaneously process a sample and image the processed portions of the sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, splitting the plurality of electrons into two electron beams, and then modifying the focal properties of at least one of the electron beams such that the two electron beams have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam. The STEM beam is then used to process a region of the sample to induce a physical change (e.g., perform milling, deposition, charge adjustment, phase change, etc.). The second electron beam is focused to act as a TEM beam to perform imaging of the region of the sample being processed.
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公开(公告)号：EP3901980A2
公开(公告)日：2021-10-27
申请号：EP21164759.9
申请日：2021-03-25
Applicant: FEI Company
Inventor： Henstra, Alexander , Deng, Yuchen , Kohr, Holger
Abstract: Methods for using a single electron microscope system for investigating a sample with TEM and STEM techniques include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam that is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the STEM beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image and a STEM image.
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公开(公告)号：EP3889591A1
公开(公告)日：2021-10-06
申请号：EP21164764.9
申请日：2021-03-25
Applicant: FEI Company
Inventor： Buijsse, Bart , Henstra, Alexander , Deng, Yuchen
IPC: G01N23/20058 , H01J3/00 , H01J37/00
Abstract: Diffraction patterns of a sample at various tilt angles are acquired by irradiating a region of interest using a first charged particle beam. Sample images are acquired by irradiating the region of interest using a second charged particle beam. The first and second charged particle beams are formed by splitting charged particles generated by a charged particle source.
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公开(公告)号：EP3657528A1
公开(公告)日：2020-05-27
申请号：EP18208355.0
申请日：2018-11-26
Applicant: FEI Company
Inventor： Franken, Erik Michiel , Schoenmakers, Remco , Janssen, Bart Jozef , Verheijen, Martin , Kohr, Holger , Deng, Yuchen , Voigt, Andreas
IPC: H01J37/28 , G01N23/046
Abstract: The invention relates to a method of imaging a sample, said sample mounted on a sample holder in an electron microscope, the electron microscope comprising an electron source for generating a beam of energetic electrons along an optical axis and optical elements for focusing and deflecting the beam so as to irradiate the sample with a beam of electrons. The sample holder is capable of positioning and tilting the sample with respect to the electron beam. The method comprises the step of acquiring a tilt series ts, tm, te of images by irradiating the sample with the beam of electrons, and concurrently changing a position Ps,Pm,Pe of the sample during acquisition of the images, so that each image is acquired at an associated unique tilt angle t and an associated unique position P.
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公开(公告)号：EP4318546A2
公开(公告)日：2024-02-07
申请号：EP23206141.6
申请日：2021-03-25
Applicant: FEI Company
Inventor： Henstra, Alexander , Deng, Yuchen , Kohr, Holger
IPC: H01J37/26
Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.
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公开(公告)号：EP3889993A1
公开(公告)日：2021-10-06
申请号：EP21164758.1
申请日：2021-03-25
Applicant: FEI Company
Inventor： Henstra, Alexander , Deng, Yuchen , Kohr, Holger , Mohammadi-Gheidari, Ali
Abstract: Methods and systems for investigating a sample using a dual beam bifocal charged particle microscope, according to the present disclosure include emitting a plurality of charged particles toward the sample, forming the plurality of charged particles into a first charged particle beam and a second charged particle beam, and modifying the focal properties of at least one of the first charged particle beam and the second charged particle beam. The focal properties of at least one of the first charged particle beam and the second charged particle beam is modified such that the corresponding focal planes of the first charged particle beam and the second charged particle beam are different.
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公开(公告)号：EP3889992A1
公开(公告)日：2021-10-06
申请号：EP21164757.3
申请日：2021-03-25
Applicant: FEI Company
Inventor： Henstra, Alexander , Deng, Yuchen , Kohr, Holger
Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.
