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    EXHAUST GAS PROCESSING DEVICE
    8.
    发明公开
    EXHAUST GAS PROCESSING DEVICE 审中-公开

    公开(公告)号：EP3964278A1

    公开(公告)日：2022-03-09

    申请号：EP20896661.4

    申请日：2020-11-25

    申请人： Fuji Electric Co., Ltd.

    发明人： TAKAHASHI Kuniyuki ,  NODA Naohiro

    IPC分类号： B01D53/14 ,  B01D53/18 ,  B01D53/50 ,  B01D53/78 ,  B01D53/92 ,  F01N3/04 ,  F01N3/08 ,  B63H21/32

    摘要： Provided is an exhaust gas treatment apparatus comprising a reaction tower into which an exhaust gas is introduced and a liquid for treating the exhaust gas is supplied, a first ejection unit configured to eject the liquid into the reaction tower, a volumeric flow rate control unit configured to control a volumeric flow rate of the liquid that is supplied to the reaction tower, an exhaust gas introduction pipe configured to introduce the exhaust gas into the reaction tower, and a spray unit configured to spray a drain liquid obtained as a result of treating the exhaust gas to the exhaust gas, in the exhaust gas introduction pipe or in the vicinity of the exhaust gas introduction pipe inside the reaction tower, wherein the volumeric flow rate control unit is configured to control the volumeric flow rate of the liquid that is supplied to the reaction tower, based on at least one of pH and total alkalinity of the drain liquid.