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    Liquid jet head and liquid jet apparatus
    91.
    发明专利
    Liquid jet head and liquid jet apparatus 有权
    液体喷射头和液体喷射装置

    公开(公告)号：JP2014124885A

    公开(公告)日：2014-07-07

    申请号：JP2012284507

    申请日：2012-12-27

    Applicant: Seiko Epson Corp ,  セイコーエプソン株式会社

    Inventor： NAGATOYA MASARU ,  NAITO NOBUHIRO

    IPC: B41J2/045 ,  B41J2/055 ,  B41J2/16

    CPC classification number: B41J2/14233 ,  B41J2/1606 ,  B41J2/161 ,  B41J2/1642 ,  B41J2/1646

    Abstract: PROBLEM TO BE SOLVED: To provide a liquid jet head and a liquid jet apparatus that can suppress variance in vibration characteristics by suppressing a diaphragm from being eroded with a liquid and can make a head thin.SOLUTION: A liquid jet head comprises: a flow passage formation substrate 10 provided with a pressure generation chamber 12 communicating nozzle openings 21 for discharging a liquid; an elastic film 50 which is provided on one surface side of the flow passage formation substrate 10 and seals the pressure generation chamber 12; and a piezoelectric actuator 300 as pressure generation means provided on the elastic film 50 and deforming the elastic film 50. At least an inner wall of the pressure generation chamber 12 is provided with a tantalum oxide film 200 formed through atomic layer deposition.

    Abstract translation: 要解决的问题：提供一种液体喷射头和液体喷射装置，其可以通过抑制隔膜被液体侵蚀并且能够使头部变薄来抑制振动特性的变化。解决方案：液体喷射头包括：流体 通道形成基板10设置有连通用于排出液体的喷嘴开口21的压力产生室12; 弹性膜50，其设置在流路形成基板10的一个表面侧并密封压力产生室12; 以及作为压力产生装置的压电致动器300，设置在弹性膜50上并使弹性膜50变形。压力产生室12的至少内壁设置有通过原子层沉积形成的氧化钽膜200。

    Liquid discharge head and image formation device
    94.
    发明专利
    Liquid discharge head and image formation device 审中-公开
    液体排出头和图像形成装置

    公开(公告)号：JP2014043029A

    公开(公告)日：2014-03-13

    申请号：JP2012185951

    申请日：2012-08-25

    Applicant: Ricoh Co Ltd ,  株式会社リコー

    Inventor： HASHIMOTO KENICHIRO

    IPC: B41J2/055 ,  B41J2/045

    CPC classification number: B41J2/1433 ,  B41J2/1606 ,  B41J2/162 ,  B41J2002/14411

    Abstract: PROBLEM TO BE SOLVED: To solve a problem that stable droplet discharge characteristics are not attained due to peeling and wear of a liquid repellent film.SOLUTION: In a nozzle plate 3, a liquid repellent film 32 is formed on a droplet discharge surface side surface 31a of a nozzle base material 31, in which a nozzle hole 41 that will serve as a nozzle 4 is formed, through a ground layer 33. A droplet discharge surface side peripheral part 43 of the nozzle 4 is smoothly recessed toward an edge part 42 of the nozzle 4. The edge part 42 of the nozzle 4 smoothly connects with an inner wall surface of the nozzle 4. The liquid repellent film 32 is formed in a uniform thickness to the edge part 42 of the nozzle 4 and is further formed to the inner wall surface of the nozzle 4.

    Abstract translation: 要解决的问题：解决由于防液膜的剥离和磨损而不能获得稳定的液滴排出特性的问题。解决方案：在喷嘴板3中，在液滴喷出表面侧表面上形成有疏液膜32 喷嘴基材31的形成有喷嘴4的喷嘴孔41的喷嘴基材31，喷嘴4的液滴排出面侧周缘部43朝向边缘部42平滑地凹入 喷嘴4的边缘部42与喷嘴4的内壁面平滑地连接。疏液膜32形成为与喷嘴4的边缘部42均匀的厚度，并进一步形成为 喷嘴4的内壁表面。

    Liquid-repellent film forming method
    96.
    发明专利
    Liquid-repellent film forming method 有权

    公开(公告)号：JP5345034B2

    公开(公告)日：2013-11-20

    申请号：JP2009222967

    申请日：2009-09-28

    Applicant: 富士フイルム株式会社

    Inventor： 浩幹 内山

    IPC: B41J2/135

    CPC classification number: B41J2/155 ,  B41J2/14233 ,  B41J2/1606 ,  B41J2/1642 ,  B41J2002/14459 ,  B41J2202/20

    Abstract: The method forms a liquid-repellent film on a surface of a nozzle plate having nozzle apertures through which droplets of liquid are ejected. The method includes: a termination process step of carrying out a hydrogen termination process or a halogen termination process on a surface of a nozzle plate, at least a portion of the surface of the nozzle plate being made of a material containing silicon; and a liquid-repellent film formation step of forming a liquid-repellent film on the surface of the nozzle plate after the termination process step by bringing a liquid-repellent film raw material into contact with the surface of the nozzle plate while applying energy to the surface. Each molecule constituting the liquid-repellent film raw material has an unsaturated carbon bond at an end and has a liquid-repellent functional group. The liquid-repellent film is bonded to the surface of the nozzle plate through silicon-carbon bonds.

    Liquid droplet ejection device and method for manufacturing liquid droplet ejection device
    97.
    发明专利
    Liquid droplet ejection device and method for manufacturing liquid droplet ejection device 有权
    液滴喷射装置及制造液滴喷射装置的方法

    公开(公告)号：JP2013220613A

    公开(公告)日：2013-10-28

    申请号：JP2012094516

    申请日：2012-04-18

    Applicant: Seiko Epson Corp ,  セイコーエプソン株式会社

    Inventor： TAKEUCHI JUNICHI

    IPC: B41J2/01 ,  B41J2/045 ,  B41J2/055 ,  B41J2/135 ,  B41J2/165

    CPC classification number: B41J2/16535 ,  B41J2/1433 ,  B41J2/1606 ,  B41J2/162 ,  B41J2/1628 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/164 ,  B41J2/1642

    Abstract: PROBLEM TO BE SOLVED: To provide a liquid droplet ejection device capable of preventing a liquid repellent layer from separating, even if a liquid droplet ejection face is not covered with a fixing plate at the end of a nozzle plate, and to provide a method for manufacturing a liquid droplet ejection device.SOLUTION: In a liquid droplet ejection head 10, a liquid repellent layer 17 is continuously formed from a liquid droplet ejection face 1a to the halfway position of the thickness direction of the end faces 101 and 102 of a nozzle plate 1. Consequently, a wiping member 4 butts against the nozzle plate 1, the wiping member 4 does not butt against the edge of the liquid repellent layer 17. Consequently, since even the ends 106 and 107 of the nozzle plate 1 located on the starting point side of wiping by the wiping member 4 do not need to be made a structure in which the liquid droplet ejection face 1a of the nozzle plate 1 is superposed on the fixing plate 18, the size of the nozzle plate 1 can be reduced.

    Abstract translation: 要解决的问题：即使在喷嘴板的端部没有用固定板覆盖液滴喷射面的情况下，也能够提供能够防止排液层分离的液滴喷射装置， 制造液滴喷射装置。解决方案：在液滴喷射头10中，液滴排出面17连续地形成为喷嘴的端面101和102的厚度方向的中途位置 因此，擦拭构件4抵靠喷嘴板1，擦拭构件4不会抵靠防液层17的边缘。因此，由于即使喷嘴板1的端部106和107位于 通过擦拭构件4的擦拭起点侧不需要形成其中喷嘴板1的液滴喷射面1a重叠在固定板18上的结构，喷嘴P1的尺寸 食物1可以减少。

    Method for manufacturing water repellent film and water repellent film manufactured by the manufacturing method
    99.
    发明专利
    Method for manufacturing water repellent film and water repellent film manufactured by the manufacturing method 有权
    制造水膜制造方法及制造方法制造的水膜生产薄膜

    公开(公告)号：JP2013155408A

    公开(公告)日：2013-08-15

    申请号：JP2012016924

    申请日：2012-01-30

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： SHINKAWA TAKAMI

    IPC: C23C14/12 ,  B41J2/135

    CPC classification number: B05D1/60 ,  B05D1/185 ,  B05D5/08 ,  B41J2/14233 ,  B41J2/1606 ,  B41J2202/03

    Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a water repellent film that has superior chemical resistance and wiping resistance, and can prevent the formation of surplus water repellent material, and to provide a water repellent film manufactured by the method.SOLUTION: A method for manufacturing a water repellent film includes: an organic film formation step of forming an organic film on a substrate using a silane coupling agent by a vapor phase deposition method; and a film formation condition specifying step of specifying film formation conditions in the organic film formation step. The film formation condition specifying step includes: a temperature specifying step; and a film formation duration specifying step of measuring a time at which a bead of surplus water repellent material is formed at the temperature specified in the temperature specifying step, and specifying a timer shorter than the measured time as a film formation duration. There is also provided a water repellent film manufactured by the method.

    Abstract translation: 要解决的问题：提供具有优异的耐化学性和耐擦性的防水膜的制造方法，并且可以防止形成多余的防水材料，并提供通过该方法制造的防水膜。解决方案：A 防水膜的制造方法包括：使用硅烷偶联剂通过气相沉积法在基板上形成有机膜的有机膜形成步骤; 以及在有机成膜步骤中指定成膜条件的成膜条件确定步骤。 成膜条件指定步骤包括：温度指定步骤; 以及成膜持续时间确定步骤，其在温度指定步骤中指定的温度下测量形成多余的防水材料的珠粒的时间，并指定比测量的时间短的定时器作为成膜持续时间。 还提供了通过该方法制造的防水膜。

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