摘要:
PURPOSE: A semiconductor device including a fuse array and an operating method thereof are provided to omit an access operation of unnecessary information about an anti-fuse by implementing an anti-fuse with an array structure. CONSTITUTION: An anti-fuse array(1100) has a plurality of rows and columns. A first register unit(1400) receives fuse data from the anti-fuse array in parallel. A second register unit(1500) successively receives the fuse data from the first register unit at least one bit by one bit.
摘要:
PURPOSE: An anti-fuse memory cell, a manufacturing method thereof, a non-volatile memory apparatus including the same, and a memory apparatus which includes a repair function are provided to reduce impurity density of a drain region of a selection transistor, thereby effectively suppressing program interruptions generated during a program operation. CONSTITUTION: A selection transistor(1110a) and an anti-fuse(1120a) are arranged on the same substrate(1130). The selection transistor comprises a first gate(1111), a first gate insulating layer(1112), a first source region(1113), and a first drain region(1114). The first gate is connected to a read word line(WLR1). The anti-fuse comprises a second gate(1121), a second gate insulating layer(1122), a second area region(1123), and a second drain region(1124). The second gate is connected to a program word line(WLP1).
摘要:
PURPOSE: An anti-fuse, an anti-fuse circuit including the same, and an anti-fuse manufacturing method are provided to improve a scattering property according to a destroyed position after destroying a gate oxidation film, thereby accurately performing an anti-fusing process. CONSTITUTION: A device isolation region(12) is arranged to an inward direction from the supper surface of a semiconductor substrate(11). A channel spreading region(14) is surrounded by the device isolation region. The channel spreading region is arranged with an ion injection method or chemical vapor deposition method. A gate oxidation film(15) is arranged in the upper part of the channel spreading region. A gate electrode(16) is arranged in order to cover the upper surface of the gate oxidation film.
摘要:
본 발명은 비트라인 센스 앰프의 센싱 효율을 향상시키는 반도체 메모리 장치에 대하여 개시된다. 반도체 메모리 장치는, 복수개의 워드라인들과 복수개의 비트라인들의 교차점에 연결되는 복수개의 메모리 셀들을 포함하는 메모리 셀 어레이 블락, 복수개의 비트라인들 중 반의 비트라인들과 각각 연결되고 비트라인과 상보 비트라인 사이의 전압 레벨을 감지 증폭하는 센스 앰프, 그리고 메모리 셀 어레이 블락의 반의 비트라인들과 연결되고 더미 부하 신호에 응답하여 메모리 셀 어레이 블락의 부하와 더미 블락의 부하를 서로 다르게 제어하는 더미 블락을 포함한다.
摘要:
PURPOSE: A circuit for precharging the bit line of a DRAM is provided to remove the instability of a bit line voltage by supplying a voltage corresponding to a half of the power supply voltage to a bit line pair. CONSTITUTION: A plurality of switches(23-26) are connected between an output node outputting a bit line voltage and a power source. A plurality of capacitors(21, 22) are connected between two adjacent switches and a ground voltage. The voltage of an output node is precharged by a half of a power voltage according to each operation of the plural switches.