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公开(公告)号：KR1020100005680A
公开(公告)日：2010-01-15
申请号：KR1020090061135
申请日：2009-07-06
申请人： 캐논 가부시끼가이샤
IPC分类号： H01L21/027
CPC分类号： G03F7/70941 , G03F7/70591 , G03F7/7085 , H01L21/67242
摘要： PURPOSE: An exposure apparatus and a device manufacturing method are provided to obtain information indicating the surface state of the optical element of the illumination optical system in the exposure apparatus. CONSTITUTION: An exposure apparatus comprises an imaging optical system, an illumination optical system(21), a reflecting surface(301), and a processor. The imaging optical system has an optical element. The illumination optical system projects light to reticle. The reflecting surface reflects the light toward the optical element. The processor extracts information from signals and obtains information indicating the surface state of the optical element.
摘要翻译： 目的：提供曝光装置和装置制造方法，以获得表示曝光装置中的照明光学系统的光学元件的表面状态的信息。 构成：曝光装置包括成像光学系统，照明光学系统（21），反射面（301）和处理器。 成像光学系统具有光学元件。 照明光学系统将光投射到掩模版。 反射面将光朝向光学元件反射。 处理器从信号中提取信息并获得指示光学元件的表面状态的信息。
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公开(公告)号：KR101988084B1
公开(公告)日：2019-09-30
申请号：KR1020160002444
申请日：2016-01-08
申请人： 캐논 가부시끼가이샤
发明人： 사이토노부유키
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公开(公告)号：KR101633317B1
公开(公告)日：2016-06-24
申请号：KR1020130036122
申请日：2013-04-03
申请人： 캐논 가부시끼가이샤
发明人： 사이토노부유키
CPC分类号： G03F7/70133 , G03F7/70058 , G03F7/70066 , G03F7/7055
摘要： 조명광학계는, 피조명면의조명범위를규정하는조리개; 상기조리개의개구의화상을상기피조명면에결상하는촬상광학계; 상기피조명면의목표조명범위의크기 B를사용하는값(B÷β)에추가된오프셋량δ를취득하는취득부 ; 및식 A=B÷β+δ를만족하도록상기취득된오프셋량δ에의거하여상기개구의크기 A 를조정하는조정부를구비하고, 상기β 는상기촬상광학계의결상배율이고, 상기취득된오프셋량δ은상기피조명면의상기목표조명범위의상기크기 B 에따라다르다.
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公开(公告)号：KR100922912B1
公开(公告)日：2009-10-22
申请号：KR1020070134795
申请日：2007-12-21
申请人： 캐논 가부시끼가이샤
IPC分类号： H01L21/027
CPC分类号： G03F7/7085 , G01N21/552 , G03F7/70341 , G03F7/70558
摘要： 본 발명의 노광장치는 원판의 패턴 상을 기판에 투영하는 투영 광학계; 및 상기 투영 광학계로부터 사출된 광을 검지하는 센서를 포함하되, 상기 센서는 수광면을 가지는 수광 소자 및 상기 투영 광학계로부터 사출된 광을 상기 수광면을 향하여 반사시키는 반사면을 구비한 광학 부재를 포함하며, 상기 반사면은 상기 수광면에 대해서 예각을 이루는 것을 특징으로 한다.
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公开(公告)号：KR1020160088802A
公开(公告)日：2016-07-26
申请号：KR1020160002444
申请日：2016-01-08
申请人： 캐논 가부시끼가이샤
发明人： 사이토노부유키
CPC分类号： G03F7/2028
摘要： 노광장치가, 기판의주변부를광에노광하고, 기판에광을조사하도록구성된광학계; 기판을보유지지하고광학계의광축에수직인방향으로기판을위치설정하기위한방향으로이동되도록구성된스테이지; 및스테이지가이동되게하도록구성된제어기를포함한다. 상기제어기는, 광학계로부터의광이기판의미리결정된부분에조사되도록, 광학계의텔레센트리시티및 광축에평행한방향에서의주변부와광학계사이의거리에대한정보에기초하여, 스테이지를이동시킨다.
摘要翻译： 本发明涉及一种能够将基板部分精确地曝光的曝光装置。 曝光装置包括：将基板的周边区域曝光并使其照射基板的光学系统; 形成为保持和支撑基板的台阶，并且沿着垂直于光学系统的光轴的方向设置基板的位置的方向移动; 以及形成为使台架移动的控制器。 控制器基于与光学系统的光轴平行的方向，基于关于远心度的信息和光学系统与外围区域之间的距离来移动舞台，以便将基板上的预定部分照射到基底上的光 光学系统。
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公开(公告)号：KR1020130113378A
公开(公告)日：2013-10-15
申请号：KR1020130036122
申请日：2013-04-03
申请人： 캐논 가부시끼가이샤
发明人： 사이토노부유키
CPC分类号： G03F7/70133 , G03F7/70058 , G03F7/70066 , G03F7/7055 , G02B27/40 , G03F7/20 , H01L21/027
摘要： PURPOSE: An illumination optical system is provided to prevent the blurring of images and the degradation of the exposure within a target illumination range. CONSTITUTION: An illumination optical system comprises an aperture (105) determining the illumination range of an illuminated surface; an imaging pickup optical system (106) forming an image of the opening of the aperture on the illuminated surface; an operation unit (113) calculating the size of the opening and the offset within a target illumination range of the illuminated surface by using the data within the target illumination range of the illuminated surface; and an adjustment unit (114) adjusting the size of the opening according to the calculated offset. The offset varies according to the size of the target illumination range of the illuminated surface.
摘要翻译： 目的：提供照明光学系统，以防止图像模糊和目标照明范围内的曝光劣化。 构成：照明光学系统包括确定被照射表面的照明范围的孔（105）; 成像拾取光学系统（106），其形成所述照明表面上的所述孔的开口的图像; 操作单元，通过使用被照射表面的目标照明范围内的数据，计算被照射表面的目标照明范围内的开口尺寸和偏移量; 和调整单元（114），根据所计算的偏移来调节开口的尺寸。 偏移根据被照射表面的目标照明范围的大小而变化。
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公开(公告)号：KR1020090113786A
公开(公告)日：2009-11-02
申请号：KR1020090036852
申请日：2009-04-28
申请人： 캐논 가부시끼가이샤
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/7085 , G03F7/2041 , G03F7/70591 , G03F7/7095
摘要： PURPOSE: An immersion exposure apparatus and a method for manufacturing a device are provided to prevent defect by contaminant attached to the surface contacted with liquid of an optical device comprising a projection optical system in wafer exposure and to measure reflectivity of an optical device comprising a projection optical system. CONSTITUTION: An immersion exposure apparatus includes an optical element(11), a reflective surface(42), a water repellent coating layer(43) in which peeled areas(45,46) are formed, a light intensity sensor(4) which detects light intensity of first light and second light, and an arithmetic processing unit which calculates a reflectance of the optical element, wherein the first light enters the projection optical system(1), passes through the peeled area to be reflected by the reflective surface, is reflected on a surface of the optical element, and passes through the peeled area to be received by the light intensity sensor, and the second light enters the projection optical system and passes through the peeled area to be received by the light intensity sensor without being reflected on the reflective surface and the surface of the optical element.
摘要翻译： 目的：提供浸没曝光装置和装置的制造方法，以防止在晶片曝光中附着于与包括投影光学系统的光学装置的液体接触的表面的污染物的缺陷，并测量包括投影的光学装置的反射率 光学系统。 构成：浸没曝光装置包括光学元件（11），反射表面（42），其中形成有剥离区域（45,46）的防水涂层（43），光强度传感器（4），其检测 以及算术处理单元，其计算第一光进入投影光学系统（1）的光学元件的反射率，穿过被反射面反射的被剥离区域，是 在光学元件的表面上反射，并且通过被光泽度传感器接收的剥离区域，并且第二光线进入投影光学系统并通过被剥离的区域以被光强度传感器接收而不被反射 在光学元件的反射表面和表面上。
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公开(公告)号：KR1020090013094A
公开(公告)日：2009-02-04
申请号：KR1020080074351
申请日：2008-07-30
申请人： 캐논 가부시끼가이샤
IPC分类号： H01L21/027
CPC分类号： G03F7/70983 , G03F7/70225 , G03F7/70591 , G03F7/70941
摘要： An exposure apparatus and the device manufacturing method are provided to get the information for the surface state of the optical element by the information processing unit using the second light. The exposure system(1) for exposing the substrate(51) by using the pattern formed in the reticle(3) comprises the optical element(11, 12), the reflecting surface(42) reflecting the light facing the corresponding projection optical system and the information processing unit which uses the first light is reflected on the surface of the optical element and the reflecting surface and the second light is not reflected on the surface of the optical element and reflecting surface. The information processing unit obtains the information showing the surface state of the optical element based on the second light and the first light detected by sensor.
摘要翻译： 提供一种曝光装置和装置制造方法，用于通过信息处理单元使用第二光来获得用于光学元件的表面状态的信息。 用于通过使用在掩模版（3）上形成的图案使基板（51）曝光的曝光系统（1）包括光学元件（11,12），反射面对相应的投影光学系统的光的反射表面（42） 使用第一光的信息处理单元被反射在光学元件的表面和反射表面上，并且第二光不被反射在光学元件和反射表面上。 信息处理单元基于第二光和由传感器检测到的第一光获得表示光学元件的表面状态的信息。
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公开(公告)号：KR101031966B1
公开(公告)日：2011-04-29
申请号：KR1020090036852
申请日：2009-04-28
申请人： 캐논 가부시끼가이샤
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/7085
摘要： 본 발명의 액침노광장치는, 광학소자(11), 반사면(42), 박리영역(45) 및 (46)이 형성된 발수코팅층(43), 제1광 및 제2광의 광량을 검출하는 광량센서(4), 및 광학소자(11)의 반사율을 산출하는 연산처리부를 가지고, 제1광은 투영광학계(1)에 입사하고, 박리영역(46)을 통과하여 반사면(42)에 의해 반사되고, 광학소자(11)의 표면에서 반사하고, 박리영역(45)을 통과하여 광량센서(4)에 의해 수광되는 광이고, 제2광은 투영광학계(1)에 입사하고, 반사면(42) 및 광학소자(11)의 표면에서 반사하지 않고, 박리영역(45)을 통과해서 광량센서(4)에 의해 수광되는 광이다.
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公开(公告)号：KR1020080058260A
公开(公告)日：2008-06-25
申请号：KR1020070134795
申请日：2007-12-21
申请人： 캐논 가부시끼가이샤
IPC分类号： H01L21/027
CPC分类号： G03F7/7085 , G01N21/552 , G03F7/70341 , G03F7/70558 , G03F7/70233 , G03F7/2041
摘要： An exposure apparatus and a device fabrication method are provided to form a sharp angle between a reflection surface of an optical member and a light receiving surface of a light receiving device so as to improve NA of the exposed light. An exposure apparatus comprises a projection optical system, and a sensor. The projection optical system projects a pattern phase of a disk to a substrate(2). The sensor detects light injected from the optical system. The sensor includes a light receiving device(3) having a light receiving surface, and an optical member having a reflection surface for reflecting the light toward the light receiving surface. The reflection surface includes a side with a truncated conical prism shape or a truncated pyramidal prism shape. The sensor includes a permeable substrate near the optical system. An opening pattern is shaped at a light shielding film(5).
摘要翻译： 提供曝光装置和装置制造方法，以在光学构件的反射表面和光接收装置的光接收表面之间形成锐角，以便改善曝光的NA。 曝光装置包括投影光学系统和传感器。 投影光学系统将盘的图案相位投影到基板（2）。 传感器检测从光学系统注入的光。 传感器包括具有光接收表面的光接收装置（3）和具有用于将光朝向光接收表面反射的反射表面的光学构件。 反射表面包括具有截头圆锥棱镜形状或截头锥形棱镜形状的一侧。 该传感器包括靠近光学系统的可渗透基底。 开口图案在遮光膜（5）处成形。
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