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公开(公告)号：US20190147579A1
公开(公告)日：2019-05-16
申请号：US16160958
申请日：2018-10-15
发明人： Wei FANG , Zhao-Li ZHANG , Jack JAU
摘要： An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.
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公开(公告)号：US10109456B2
公开(公告)日：2018-10-23
申请号：US15633639
申请日：2017-06-26
发明人： Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/28 , H01J37/147 , H01J37/12
摘要： A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
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公开(公告)号：US20180240645A1
公开(公告)日：2018-08-23
申请号：US15440111
申请日：2017-02-23
发明人： HSUAN-BIN HUANG , CHUN-LIANG LU , CHIN-FA TU , WEN-SHENG LIN , YOU-JIN WANG
CPC分类号： H01J37/261 , G01B11/00 , H01J37/18 , H01J37/185 , H01J37/20 , H01J37/28 , H01J2237/022 , H01J2237/20292 , H01J2237/28 , H01L21/67201 , H01L21/67265 , H01L21/67766
摘要： A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. In the invention, the system is designed to improve the contamination particles from components in the load lock system of charged particle beam inspection tool and also to simplify its assembly.
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公开(公告)号：US09799484B2
公开(公告)日：2017-10-24
申请号：US14964221
申请日：2015-12-09
发明人： Shuai Li
IPC分类号： H01J37/143 , H01J37/28 , H01J3/20 , H01J37/09
CPC分类号： H01J37/143 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/09 , H01J37/14 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/06308 , H01J2237/06375 , H01J2237/0653 , H01J2237/083 , H01J2237/141 , H01J2237/1415 , H01J2237/2806 , H01J2237/2817
摘要： This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.
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公开(公告)号：US09754760B2
公开(公告)日：2017-09-05
申请号：US15404694
申请日：2017-01-12
发明人： Shuai Li
IPC分类号： H01J37/143 , H01J37/28 , H01J37/09
CPC分类号： H01J37/143 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/09 , H01J37/14 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/06308 , H01J2237/06375 , H01J2237/0653 , H01J2237/083 , H01J2237/141 , H01J2237/1415 , H01J2237/2806 , H01J2237/2817
摘要： This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.
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公开(公告)号：US09691588B2
公开(公告)日：2017-06-27
申请号：US15065342
申请日：2016-03-09
发明人： Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/28 , H01J37/147
CPC分类号： H01J37/28 , H01J37/12 , H01J37/1472 , H01J2237/04924 , H01J2237/083 , H01J2237/1205 , H01J2237/1516 , H01J2237/2817
摘要： A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
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公开(公告)号：US20170176358A1
公开(公告)日：2017-06-22
申请号：US15386735
申请日：2016-12-21
发明人： Roland YEH
IPC分类号： G01N23/225
CPC分类号： G01R31/307 , H01J37/28 , H01J2237/221 , H01J2237/24564 , H01J2237/24592
摘要： A structure, for defect inspection, is provided, which includes a scanning pad scanned by an electron beam inspection tool and a test key. The structure can be located in the scribe line. A virtual grounding pad is further provided if the test key is located in the dummy pattern regions.
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公开(公告)号：US20170154756A1
公开(公告)日：2017-06-01
申请号：US15365145
申请日：2016-11-30
发明人： Weiming Ren , Xuedong Liu , Xuerang Hu , Zhongwei Chen
IPC分类号： H01J37/28 , H01J37/14 , H01J37/153 , H01J37/244 , H01J37/20
CPC分类号： H01J37/28 , H01J37/14 , H01J37/141 , H01J37/153 , H01J37/20 , H01J37/244 , H01J37/292 , H01J2237/0453 , H01J2237/1532 , H01J2237/24465 , H01J2237/24592 , H01J2237/2806 , H01J2237/2817
摘要： A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.
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公开(公告)号：US20170125204A1
公开(公告)日：2017-05-04
申请号：US15404694
申请日：2017-01-12
发明人： Shuai Li
IPC分类号： H01J37/143 , H01J37/09 , H01J37/28
CPC分类号： H01J37/143 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/09 , H01J37/14 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/06308 , H01J2237/06375 , H01J2237/0653 , H01J2237/083 , H01J2237/141 , H01J2237/1415 , H01J2237/2806 , H01J2237/2817
摘要： This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.
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公开(公告)号：US09601311B2
公开(公告)日：2017-03-21
申请号：US15060576
申请日：2016-03-03
发明人： Ying Luo , KuoFeng Tseng , Zhonghua Dong
CPC分类号： H01J37/28 , H01J37/20 , H01J2237/20292 , H01J2237/2817
摘要： Laser sub-divisional error (SDE) effect is compensated by using adaptive tuning. This compensated signal can be applied to position detection of stage in ebeam inspection tool, particularly for continuous moving stage.
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