公开(公告)号：US20110014858A1

公开(公告)日：2011-01-20

申请号：US12837705

申请日：2010-07-16

申请人： Ching-Ming TSAI ,  Fred Sun ,  Sheng-Huan Liu ,  Jia-Cheng Hsu ,  Ananth Naman ,  Hao-Kuang Chiu ,  Dinesh Khanna

发明人： Ching-Ming TSAI ,  Fred Sun ,  Sheng-Huan Liu ,  Jia-Cheng Hsu ,  Ananth Naman ,  Hao-Kuang Chiu ,  Dinesh Khanna

IPC分类号： B24D11/00

CPC分类号： B24B37/26

摘要： The present invention provides polishing pads for use in CMP processes. In one embodiment, a pad comprises a surface defining a plurality of grooves with landing surfaces separating the grooves, the landing surfaces together defining a substantially coplanar polishing surface, each groove having a depth of at least about 10 mil and a width, WG, with any two adjacent grooves being separated from each other a landing surface having a width, WL, wherein the quotient WL/WG is less than or equal to 3. In a preferred embodiment, the surface of the pad defines a series of concentric substantially circular grooves. In an alternative embodiment, the surface of the pad defines a spiral groove having a depth of at least about 10 mil and a width WG, and a spiral landing surface outlining spiral groove the having a width, WL, wherein the spiral landing surface defines a substantially coplanar polishing surface and the quotient WL/WG is less than or equal to 3.

摘要翻译： 本发明提供了用于CMP工艺的抛光垫。 在一个实施例中，垫包括限定具有分离凹槽的着陆表面的多个凹槽的表面，所述着陆表面一起限定基本上共面的抛光表面，每个凹槽具有至少约10密耳的深度和宽度WG， 任何两个相邻的凹槽彼此分开具有宽度WL的着陆表面，其中商WL / WG小于或等于3.在优选实施例中，垫的表面限定了一系列同心的大致圆形的凹槽 。 在替代实施例中，垫的表面限定具有至少约10密耳深度和宽度WG的螺旋槽，以及螺旋着陆表面，其具有宽度为WL的螺旋槽，其中螺旋着陆表面限定了 基本上共面的抛光表面和商WL / WG小于或等于3。

公开(公告)号：US20050203286A1

公开(公告)日：2005-09-15

申请号：US10902930

申请日：2004-08-02

申请人： Hsiao-San Chen ,  Jia-Cheng Hsu ,  Chia-Huei Yu

发明人： Hsiao-San Chen ,  Jia-Cheng Hsu ,  Chia-Huei Yu

IPC分类号： C07D401/04 ,  C09B44/08 ,  C09B62/447

CPC分类号： C07D401/04 ,  C09B62/085 ,  C09B62/09 ,  C09B62/4415 ,  D06P3/008 ,  D06P3/148 ,  D06P3/248 ,  D06P3/666

摘要： An environmental protection reactive dyestuff of the following formula (I) is disclosed, wherein R1, R2, D, M are defined as in the specification. The dyestuff of the invention is distinguished by a high fixation and a very good build-up. It is distinguished also by a green environmental protection and a low salt, a low base, a high exhaustion, non-contain heavy metal and halogen atoms, and it has fiber-reactive properties and is very highly suitable for dyeing and printing of materials containing either cellulose fibers, such as cotton, synthetic cotton, hemp, and synthetic hemp, or amide containing fibers such as wool and nylon.

摘要翻译： 公开了下式（I）的环保活性染料，其中R 1，R 2，D，M如说明书中所定义。 本发明的染料的特征在于高固定性和非常好的聚集性。 还具有绿色环保，低盐，低碱，高耗尽，不含重金属和卤素原子的特点，具有纤维反应性，非常适用于染色和印刷含有 纤维素纤维如棉花，合成棉花，大麻和合成大麻，或含酰胺的纤维如羊毛和尼龙。