公开(公告)号：US20120179953A1

公开(公告)日：2012-07-12

申请号：US13368461

申请日：2012-02-08

申请人： Yutaka SHINAGAWA ,  Takeshi KATAOKA ,  Eiichi ISHIKAWA ,  Toshihiro TANAKA ,  Kazumasa YANAGISAWA ,  Kazufumi SUZUKAWA

发明人： Yutaka SHINAGAWA ,  Takeshi KATAOKA ,  Eiichi ISHIKAWA ,  Toshihiro TANAKA ,  Kazumasa YANAGISAWA ,  Kazufumi SUZUKAWA

IPC分类号： G11C16/04 ,  G06F11/10 ,  H03M13/05

CPC分类号： G11C16/349 ,  G11C16/06 ,  G11C16/3495

摘要： A semiconductor integrated circuit has a central processing unit and a rewritable nonvolatile memory area disposed in an address space of the central processing unit. The nonvolatile memory area has a first nonvolatile memory area and a second nonvolatile memory area, which memorize information depending on the difference of threshold voltages. The first nonvolatile memory area has the maximum variation width of a threshold voltage for memorizing information set larger than that of the second nonvolatile memory area. The first nonvolatile memory area can be prioritized to expedite a read speed of the memory information, and the second nonvolatile memory area can be prioritized to guarantee the number of times of rewrite operation of memory information more.

摘要翻译： 半导体集成电路具有设置在中央处理单元的地址空间中的中央处理单元和可重写的非易失性存储区域。 非易失性存储区域具有第一非易失性存储区域和第二非易失性存储器区域，其根据阈值电压的差异来存储信息。 第一非易失性存储区具有用于存储大于第二非易失性存储区的信息的阈值电压的最大变化宽度。 优先考虑第一非易失性存储器区域以加快存储器信息的读取速度，并且可以对第二非易失性存储器区域进行优先排列以保证存储器信息的重写操作的次数更多。

公开(公告)号：US08130571B2

公开(公告)日：2012-03-06

申请号：US13162180

申请日：2011-06-16

申请人： Yutaka Shinagawa ,  Takeshi Kataoka ,  Eiichi Ishikawa ,  Toshihiro Tanaka ,  Kazumasa Yanagisawa ,  Kazufumi Suzukawa

发明人： Yutaka Shinagawa ,  Takeshi Kataoka ,  Eiichi Ishikawa ,  Toshihiro Tanaka ,  Kazumasa Yanagisawa ,  Kazufumi Suzukawa

IPC分类号： G11C7/00

CPC分类号： G11C16/349 ,  G11C16/06 ,  G11C16/3495

摘要： A semiconductor integrated circuit has a central processing unit and a rewritable nonvolatile memory area disposed In an address space of the central processing unit. The nonvolatile memory area has a first nonvolatile memory area and a second nonvolatile memory area, which memorize information depending on the difference of threshold voltages. The first nonvolatile memory area has the maximum variation width of a threshold voltage for memorizing information set larger than that of the second nonvolatile memory area. When the maximum variation width of the threshold voltage for memorizing information is larger, since stress to a memory cell owing to a rewrite operation of memory information becomes larger, it is inferior In a point of guaranteeing the number of times of rewrite operation; however, since a read current becomes larger, a read speed of memory information can be expedited. The first nonvolatile memory area can be prioritized to expedite a read speed of the memory information and the second nonvolatile memory area can be prioritized to guarantee the number of times of rewrite operation of memory information more.

摘要翻译： 半导体集成电路具有设置在中央处理单元的地址空间中的中央处理单元和可重写非易失性存储区域。 非易失性存储区域具有第一非易失性存储区域和第二非易失性存储器区域，其根据阈值电压的差异来存储信息。 第一非易失性存储区具有用于存储大于第二非易失性存储区的信息的阈值电压的最大变化宽度。 当用于存储信息的阈值电压的最大变化幅度较大时，由于由于存储信息的重写操作而对存储单元的应力变大，所以不利于保证重写操作的次数; 然而，由于读取电流变大，因此可以加快存储器信息的读取速度。 可以优先考虑第一非易失性存储器区域以加快存储器信息的读取速度，并且可以对第二非易失性存储器区域进行优先排列以保证存储器信息的重写操作的次数更多。

公开(公告)号：US20110246860A1

公开(公告)日：2011-10-06

申请号：US13162180

申请日：2011-06-16

申请人： Yutaka SHINAGAWA ,  Takeshi Kataoka ,  Eiichi Ishikawa ,  Toshihiro Tanaka ,  Kazumasa Yanagisawa ,  Kazufumi Suzukawa

发明人： Yutaka SHINAGAWA ,  Takeshi Kataoka ,  Eiichi Ishikawa ,  Toshihiro Tanaka ,  Kazumasa Yanagisawa ,  Kazufumi Suzukawa

IPC分类号： H03M13/05 ,  G11C16/04 ,  G06F11/10

CPC分类号： G11C16/349 ,  G11C16/06 ,  G11C16/3495

摘要： A semiconductor integrated circuit has a central processing unit and a rewritable nonvolatile memory area disposed In an address space of the central processing unit. The nonvolatile memory area has a first nonvolatile memory area and a second nonvolatile memory area, which memorize information depending on the difference of threshold voltages. The first nonvolatile memory area has the maximum variation width of a threshold voltage for memorizing information set larger than that of the second nonvolatile memory area. When the maximum variation width of the threshold voltage for memorizing information is larger, since stress to a memory cell owing to a rewrite operation of memory information becomes larger, it is inferior In a point of guaranteeing the number of times of rewrite operation; however, since a read current becomes larger, a read speed of memory information can be expedited. The first nonvolatile memory area can be prioritized to expedite a read speed of the memory information and the second nonvolatile memory area can be prioritized to guarantee the number of times of rewrite operation of memory information more.

摘要翻译： 半导体集成电路具有设置在中央处理单元的地址空间中的中央处理单元和可重写非易失性存储区域。 非易失性存储区域具有第一非易失性存储区域和第二非易失性存储器区域，其根据阈值电压的差异来存储信息。 第一非易失性存储区具有用于存储大于第二非易失性存储区的信息的阈值电压的最大变化宽度。 当用于存储信息的阈值电压的最大变化幅度较大时，由于由于存储信息的重写操作而对存储单元的应力变大，所以不利于保证重写操作的次数; 然而，由于读取电流变大，因此可以加快存储器信息的读取速度。 可以优先考虑第一非易失性存储器区域以加快存储器信息的读取速度，并且可以对第二非易失性存储器区域进行优先排列以保证存储器信息的重写操作的次数更多。

公开(公告)号：US07978545B2

公开(公告)日：2011-07-12

申请号：US12775377

申请日：2010-05-06

申请人： Yutaka Shinagawa ,  Takeshi Kataoka ,  Eiichi Ishikawa ,  Toshihiro Tanaka ,  Kazumasa Yanagisawa ,  Kazufumi Suzukawa

发明人： Yutaka Shinagawa ,  Takeshi Kataoka ,  Eiichi Ishikawa ,  Toshihiro Tanaka ,  Kazumasa Yanagisawa ,  Kazufumi Suzukawa

IPC分类号： G11C7/00

CPC分类号： G11C16/349 ,  G11C16/06 ,  G11C16/3495

摘要： A semiconductor integrated circuit has a central processing unit and a rewritable nonvolatile memory area disposed in an address space of the central processing unit. The nonvolatile memory area has a first nonvolatile memory area and a second nonvolatile memory area, which memorize information depending on the difference of threshold voltages. The first nonvolatile memory area has the maximum variation width of a threshold voltage for memorizing information set larger than that of the second nonvolatile memory area. When the maximum variation width of the threshold voltage for memorizing information is larger, since stress to a memory cell owing to a rewrite operation of memory information becomes larger, it is inferior in a point of guaranteeing the number of times of rewrite operation; however, since a read current becomes larger, a read speed of memory information can be expedited. The first nonvolatile memory area can be prioritized to expedite a read speed of the memory information and the second nonvolatile memory area can be prioritized to guarantee the number of times of rewrite operation of memory information more.

摘要翻译： 半导体集成电路具有设置在中央处理单元的地址空间中的中央处理单元和可重写的非易失性存储区域。 非易失性存储区域具有第一非易失性存储区域和第二非易失性存储器区域，其根据阈值电压的差异来存储信息。 第一非易失性存储区具有用于存储大于第二非易失性存储区的信息的阈值电压的最大变化宽度。 当用于存储信息的阈值电压的最大变化幅度较大时，由于由于存储信息的重写操作而对存储单元的应力变大，所以在保证重写操作次数方面较差; 然而，由于读取电流变大，因此可以加快存储器信息的读取速度。 可以优先考虑第一非易失性存储器区域以加快存储器信息的读取速度，并且可以对第二非易失性存储器区域进行优先排列以保证存储器信息的重写操作的次数更多。

公开(公告)号：US20100220531A1

公开(公告)日：2010-09-02

申请号：US12775377

申请日：2010-05-06

申请人： YUTAKA SHINAGAWA ,  Takeshi Kataoka ,  Eiichi Ishikawa ,  Toshihiro Tanaka ,  Kazumasa Yanagisawa ,  Kazufumi Suzukawa

发明人： YUTAKA SHINAGAWA ,  Takeshi Kataoka ,  Eiichi Ishikawa ,  Toshihiro Tanaka ,  Kazumasa Yanagisawa ,  Kazufumi Suzukawa

IPC分类号： G11C16/04 ,  G06F12/02 ,  G06F11/00 ,  G06F13/20

CPC分类号： G11C16/349 ,  G11C16/06 ,  G11C16/3495

摘要： A semiconductor integrated circuit has a central processing unit and a rewritable nonvolatile memory area disposed in an address space of the central processing unit. The nonvolatile memory area has a first nonvolatile memory area and a second nonvolatile memory area, which memorize information depending on the difference of threshold voltages. The first nonvolatile memory area has the maximum variation width of a threshold voltage for memorizing information set larger than that of the second nonvolatile memory area. When the maximum variation width of the threshold voltage for memorizing information is larger, since stress to a memory cell owing to a rewrite operation of memory information becomes larger, it is inferior in a point of guaranteeing the number of times of rewrite operation; however, since a read current becomes larger, a read speed of memory information can be expedited. The first nonvolatile memory area can be prioritized to expedite a read speed of the memory information and the second nonvolatile memory area can be prioritized to guarantee the number of times of rewrite operation of memory information more.

摘要翻译： 半导体集成电路具有设置在中央处理单元的地址空间中的中央处理单元和可重写的非易失性存储区域。 非易失性存储区域具有第一非易失性存储区域和第二非易失性存储器区域，其根据阈值电压的差异来存储信息。 第一非易失性存储区具有用于存储大于第二非易失性存储区的信息的阈值电压的最大变化宽度。 当用于存储信息的阈值电压的最大变化幅度较大时，由于由于存储信息的重写操作而对存储单元的应力变大，所以在保证重写操作次数方面较差; 然而，由于读取电流变大，因此可以加快存储器信息的读取速度。 可以优先考虑第一非易失性存储器区域以加快存储器信息的读取速度，并且可以对第二非易失性存储器区域进行优先排列以保证存储器信息的重写操作的次数更多。

公开(公告)号：US07072218B2

公开(公告)日：2006-07-04

申请号：US10486638

申请日：2002-07-03

申请人： Masamichi Fujito ,  Yuko Nakamura ,  Kazufumi Suzukawa ,  Toshihiro Tanaka ,  Yutaka Shinagawa

发明人： Masamichi Fujito ,  Yuko Nakamura ,  Kazufumi Suzukawa ,  Toshihiro Tanaka ,  Yutaka Shinagawa

IPC分类号： G11C16/04

CPC分类号： G11C7/1057 ,  G11C7/1051 ,  G11C7/1096 ,  G11C7/12 ,  G11C8/08 ,  G11C16/08 ,  H01L2924/0002 ,  H01L2924/00

摘要： A high voltage output driver derives operational power from high voltages and a switching circuit which reverses the output state of the high voltage output driver. The high voltage output driver has in a current path of the high voltages, a series circuit of a first MOS transistor (M1) and second MOS transistor (M2), with the serial connection node thereof being the driver output terminal. The switching circuit operates to reverse the complementary switching states of the first and second MOS transistors such that one transistor in the on-state is switched to an off-state first and the other transistor is switched to an on-state afterward. Even if the other MOS transistor has its Vds exceeding the minimum breakdown voltage when it operates to turn on, the through current path is already shut off, and therefore the high voltage output driver does not break down.

摘要翻译： 高电压输出驱动器从高电压导出工作电源，并切换反向高压输出驱动器的输出状态的开关电路。 高压输出驱动器具有高电压的电流路径，第一MOS晶体管（M 1）和第二MOS晶体管（M 2）的串联电路，其串联连接节点是驱动器输出端子。 开关电路操作以反转第一和第二MOS晶体管的互补开关状态，使得处于导通状态的一个晶体管首先被切换到截止状态，而另一个晶体管之后被切换到导通状态。 即使其他MOS晶体管的Vds在其操作导通时其Vds超过最小击穿电压，直通电流路径已被切断，因此高压输出驱动器不会分解。

公开(公告)号：US5748977A

公开(公告)日：1998-05-05

申请号：US628241

申请日：1996-04-04

申请人： Shumpei Kawasaki ,  Kaoru Fukada ,  Mitsuru Watabe ,  Kouki Noguchi ,  Kiyoshi Matsubara ,  Isamu Mochizuki ,  Kazufumi Suzukawa ,  Shigeki Masumura ,  Yasushi Akao ,  Eiji Sakakibara

发明人： Shumpei Kawasaki ,  Kaoru Fukada ,  Mitsuru Watabe ,  Kouki Noguchi ,  Kiyoshi Matsubara ,  Isamu Mochizuki ,  Kazufumi Suzukawa ,  Shigeki Masumura ,  Yasushi Akao ,  Eiji Sakakibara

IPC分类号： G06F12/00 ,  G06F12/06 ,  G06F13/42 ,  G06F15/78 ,  G06F13/00

CPC分类号： G06F15/7832 ,  G06F13/4239 ,  G06F15/786

摘要： A microcomputer that is easy to use and connected direct to such memories as dynamic and static RAM's and to other peripheral circuits. The microcomputer has strobe signal output terminals CASH*, CASL* and RAS* for direct connection to a dynamic RAM, and chip select signal output terminals CS0* through CS6* for outputting a chip select signal in parallel with the output from the strobe signal output terminals. The microcomputer further includes address output terminals for outputting a non-multiplexed or multiplexed address signal as needed, and data I/O terminals for selectively outputting the address signal to comply with a multiple-bus interface scheme.

公开(公告)号：US20100157689A1

公开(公告)日：2010-06-24

申请号：US12718111

申请日：2010-03-05

申请人： TOSHIHIRO TANAKA ,  Yukiko Umemoto ,  Mitsuru Hiraki ,  Yutaka Shinagawa ,  Masamichi Fujito ,  Kazufumi Suzukawa ,  Hiroyuki Tanikawa ,  Takashi Yamaki ,  Yoshiaki Kamigaki ,  Shinichi Minami ,  Kozo Katayama ,  Nozomu Matsuzaki

发明人： TOSHIHIRO TANAKA ,  Yukiko Umemoto ,  Mitsuru Hiraki ,  Yutaka Shinagawa ,  Masamichi Fujito ,  Kazufumi Suzukawa ,  Hiroyuki Tanikawa ,  Takashi Yamaki ,  Yoshiaki Kamigaki ,  Shinichi Minami ,  Kozo Katayama ,  Nozomu Matsuzaki

IPC分类号： G11C16/06 ,  H01L29/788 ,  G11C16/04

CPC分类号： G11C16/26 ,  G11C5/025 ,  G11C8/08 ,  G11C16/04 ,  G11C16/0425 ,  G11C16/0433 ,  G11C16/08 ,  G11C16/24 ,  G11C16/30 ,  H01L21/28 ,  H01L21/28273 ,  H01L27/105 ,  H01L27/115 ,  H01L27/11521 ,  H01L27/11526 ,  H01L27/11546 ,  H01L29/42328 ,  H01L29/42332 ,  H01L29/4234 ,  H01L29/66825 ,  H01L29/7885 ,  H01L29/792

摘要： A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section. Assuming that the thickness of a gate insulating film of the second transistor section is defined as tc and the thickness of a gate insulating film of the first transistor section is defined as tm, they have a relationship of tc

摘要翻译： 半导体器件包括多个非易失性存储单元（1）。 每个非易失性存储单元包括用于信息存储的MOS型第一晶体管部分（3）和选择第一晶体管部分的MOS型第二晶体管部分（4）。 第二晶体管部分具有连接到位线的位线电极（16）和连接到控制栅极控制线的控制栅电极（18）。 第一晶体管部分具有连接到源极线的源极线电极（10），连接到存储器栅极控制线的存储栅电极（14）和直接位于存储栅电极下方的电荷存储区域（11）。 第二晶体管部分的栅极耐受电压低于第一晶体管部分的栅极耐受电压。 假设第二晶体管部分的栅极绝缘膜的厚度被定义为tc，并且第一晶体管部分的栅极绝缘膜的厚度被定义为tm，它们具有tc

公开(公告)号：US07700992B2

公开(公告)日：2010-04-20

申请号：US12142566

申请日：2008-06-19

申请人： Toshihiro Tanaka ,  Yukiko Umemoto ,  Mitsuru Hiraki ,  Yutaka Shinagawa ,  Masamichi Fujito ,  Kazufumi Suzukawa ,  Hiroyuki Tanikawa ,  Takashi Yamaki ,  Yoshiaki Kamigaki ,  Shinichi Minami ,  Kozo Katayama ,  Nozomu Matsuzaki

发明人： Toshihiro Tanaka ,  Yukiko Umemoto ,  Mitsuru Hiraki ,  Yutaka Shinagawa ,  Masamichi Fujito ,  Kazufumi Suzukawa ,  Hiroyuki Tanikawa ,  Takashi Yamaki ,  Yoshiaki Kamigaki ,  Shinichi Minami ,  Kozo Katayama ,  Nozomu Matsuzaki

IPC分类号： G11C11/34

CPC分类号： G11C16/26 ,  G11C5/025 ,  G11C8/08 ,  G11C16/04 ,  G11C16/0425 ,  G11C16/0433 ,  G11C16/08 ,  G11C16/24 ,  G11C16/30 ,  H01L21/28 ,  H01L21/28273 ,  H01L27/105 ,  H01L27/115 ,  H01L27/11521 ,  H01L27/11526 ,  H01L27/11546 ,  H01L29/42328 ,  H01L29/42332 ,  H01L29/4234 ,  H01L29/66825 ,  H01L29/7885 ,  H01L29/792

摘要： A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section. Assuming that the thickness of a gate insulating film of the second transistor section is defined as tc and the thickness of a gate insulating film of the first transistor section is defined as tm, they have a relationship of tc

摘要翻译： 半导体器件包括多个非易失性存储单元（1）。 每个非易失性存储单元包括用于信息存储的MOS型第一晶体管部分（3）和选择第一晶体管部分的MOS型第二晶体管部分（4）。 第二晶体管部分具有连接到位线的位线电极（16）和连接到控制栅极控制线的控制栅电极（18）。 第一晶体管部分具有连接到源极线的源极线电极（10），连接到存储器栅极控制线的存储栅电极（14）和直接位于存储栅电极下方的电荷存储区域（11）。 第二晶体管部分的栅极耐受电压低于第一晶体管部分的栅极耐受电压。 假设第二晶体管部分的栅极绝缘膜的厚度被定义为tc，并且第一晶体管部分的栅极绝缘膜的厚度被定义为tm，它们具有tc

公开(公告)号：US20070153618A1

公开(公告)日：2007-07-05

申请号：US11713039

申请日：2007-03-02

申请人： Masamichi Fujito ,  Yutaka Shinagawa ,  Kazufumi Suzukawa ,  Ayako Kakuda ,  Akira Kato ,  Toshihiro Tanaka

发明人： Masamichi Fujito ,  Yutaka Shinagawa ,  Kazufumi Suzukawa ,  Ayako Kakuda ,  Akira Kato ,  Toshihiro Tanaka

IPC分类号： G11C8/00

CPC分类号： G11C7/18 ,  G11C16/0416 ,  G11C16/08 ,  G11C16/26 ,  G11C16/28 ,  G11C16/30 ,  G11C2207/005 ,  G11C2216/22

摘要： The read speed of an on-chip nonvolatile memory enabling electric rewrite is increased. The nonvolatile memory has a hierarchal bit line structure having first bit lines specific to each of a plurality of memory arrays, a second bit line shared between the plurality of memory arrays, a first selector circuit selecting the first bit line for each of the memory arrays to connect the selected first bit line to the second bit line, and a sense amp arranged between the output of the first selector circuit and the second bit line. The hierarchal bit line structure having the divided memory arrays can reduce the input load capacity of the sense amp.