公开(公告)号：US06447720B1

公开(公告)日：2002-09-10

申请号：US09630245

申请日：2000-07-31

Applicant: Isaac B. Horton, III ,  Kurt Anthony Garrett ,  Andrew P. Riser ,  Ronald Floyd Mathis ,  James Pierre Hauck

Inventor： Isaac B. Horton, III ,  Kurt Anthony Garrett ,  Andrew P. Riser ,  Ronald Floyd Mathis ,  James Pierre Hauck

IPC: A61L200

CPC classification number: C02F1/325 ,  A61L2/10 ,  C02F1/725 ,  C02F2201/3221 ,  C02F2201/3224 ,  C02F2201/3227 ,  C02F2201/3228 ,  C02F2301/024 ,  C02F2303/04

Abstract: An ultraviolet (UV) disinfection system and method for treating for treating fluids including a configuration and design to function effectively with at least one UV light source or lamp that is not submerged in the fluid. The UV light source is positioned outside the fluid to be disinfected via exposure to at least one UV dose zone outside the fluid being treated wherein UV light is projected into the at least one dose zone. The UV light source may be presented in a vertical riser configuration, wherein the UV light source is positioned above the fluid to be treated and projecting a UV dose zone downward toward and into the fluid to be treated, with the fluid moving upward toward the UV light source. Alternatively, the UV light source may be presented in a planar or horizontal design, wherein the UV light source is positioned above the fluid to be treated and projecting a WV dose zone downward toward and into the fluid to be treated, with the fluid moving in a direction substantially perpendicular to the UV dose zone. At least one interface plate is used to provide a surface zone for UV disinfection above the fluid and to provide additional treatment means for balancing pH, affecting effluent chemistry, and the like.

Abstract translation: 一种用于处理流体的紫外线（UV）消毒系统和方法，包括配置和设计，以有效地运行至少一个不浸没在流体中的UV光源或灯。 UV光源通过暴露于被处理流体外的至少一个UV剂量区域而定位在要消毒的流体外部，其中UV光投射到至少一个剂量区域中。 UV光源可以呈垂直提升管构造，其中UV光源位于待处理的流体上方，并且将UV剂量区域向下朝向并进入待处理流体中并且流体朝向UV移动 光源。 或者，UV光源可以以平面或水平设计呈现，其中UV光源被定位在待处理流体上方，并将WV剂量区域向下朝向并流入待处理流体，并将流体移入 大致垂直于UV剂量区的方向。 使用至少一个界面板来提供用于在流体上方进行紫外消毒的表面区域，并提供用于平衡pH，影响流出物化学等的附加处理装置。