公开(公告)号：US09386632B2

公开(公告)日：2016-07-05

申请号：US14403575

申请日：2013-05-21

Applicant: AP SYSTEMS INC.

Inventor： Sang-Hyun Ji

IPC: H05B1/02 ,  H05B3/00 ,  G01J5/00

CPC classification number: H05B1/0233 ,  G01J5/0007 ,  G01J5/0044 ,  H05B3/0047

Abstract: The present invention relates to a substrate treatment apparatus and method which perform heat treatment on a substrate, and can accurately measure the temperature of the substrate even at a low temperature. An embodiment of the present invention includes a process chamber that has a substrate treatment space, a heating housing that contains a plurality of heating lamps for generating radiant energy, a window that is placed between the heating housing and the process chamber to maintain the air-tightness of the process chamber and transmit the radiant energy to be transferred to a substrate, a first pyrometer that measures a wavelength generated at the substrate in the process chamber, and converts the wavelength into substrate measurement energy, a second pyrometer that measures a wavelength generated at the window, and converts the wavelength into window measurement energy; and a heating controller that compensates for the window measurement energy in the substrate measurement energy, thereby calculating the temperature of the substrate itself, and uses the calculated temperature of the substrate itself to control the heating lamps.

Abstract translation: 本发明涉及对基板进行热处理的基板处理装置和方法，并且即使在低温也能够精确地测量基板的温度。 本发明的实施例包括具有基板处理空间的处理室，包含用于产生辐射能的多个加热灯的加热壳体，设置在加热壳体和处理室之间的窗口， 传递处理室的密封性并传输要转移到衬底的辐射能，测量在处理室中的衬底处产生的波长并将波长转换成衬底测量能量的第一高温计，测量所产生的波长的第二高温计 在窗口处，将波长转换成窗口测量能量; 以及加热控制器，其补偿基板测量能量中的窗口测量能量，由此计算基板本身的温度，并且使用所计算的基板本身的温度来控制加热灯。

公开(公告)号：US20150181649A1

公开(公告)日：2015-06-25

申请号：US14403575

申请日：2013-05-21

Applicant: AP SYSTEMS INC.

Inventor： Sang-Hyun Ji

IPC: H05B1/02 ,  G01J5/00 ,  H05B3/00

CPC classification number: H05B1/0233 ,  G01J5/0007 ,  G01J5/0044 ,  H05B3/0047

Abstract: The present invention relates to a substrate treatment apparatus and method which perform heat treatment on a substrate, and can accurately measure the temperature of the substrate even at a low temperature. An embodiment of the present invention includes a process chamber that has a substrate treatment space, a heating housing that contains a plurality of heating lamps for generating radiant energy, a window that is placed between the heating housing and the process chamber to maintain the air-tightness of the process chamber and transmit the radiant energy to be transferred to a substrate, a first pyrometer that measures a wavelength generated at the substrate in the process chamber, and converts the wavelength into substrate measurement energy, a second pyrometer that measures a wavelength generated at the window, and converts the wavelength into window measurement energy; and a heating controller that compensates for the window measurement energy in the substrate measurement energy, thereby calculating the temperature of the substrate itself, and uses the calculated temperature of the substrate itself to control the heating lamps.

Abstract translation: 本发明涉及对基板进行热处理的基板处理装置和方法，并且即使在低温也能够精确地测量基板的温度。 本发明的实施例包括具有基板处理空间的处理室，包含用于产生辐射能的多个加热灯的加热壳体，设置在加热壳体和处理室之间的窗口， 传递处理室的密封性并传输要转移到衬底的辐射能，测量在处理室中的衬底处产生的波长并将波长转换成衬底测量能量的第一高温计，测量所产生的波长的第二高温计 在窗口处，将波长转换成窗口测量能量; 以及加热控制器，其补偿基板测量能量中的窗口测量能量，由此计算基板本身的温度，并且使用所计算的基板本身的温度来控制加热灯。