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公开(公告)号：US09400425B2
公开(公告)日：2016-07-26
申请号：US14255557
申请日：2014-04-17
Applicant: AP Systems Inc.
Inventor： Sung Ho Kwak , Min Young Cho
CPC classification number: G03F1/82 , B08B7/0042
Abstract: This invention relates to an apparatus and method for cleaning a photomask. This apparatus, suitable for use in removing an adhesive residue from a photomask, includes a photomask disposed such that a surface thereof on which an adhesive residue is left behind is directed downwards, a metal plate formed adjacent to the adhesive residue, and a laser generator for irradiating a laser onto the metal plate so that the adhesive residue is removed by heat generated from the metal plate.
Abstract translation: 本发明涉及一种清洁光掩模的装置和方法。 适用于从光掩模中去除粘合剂残留物的该装置包括光掩模，该光掩模被设置为使得其上残留有粘合剂残留物的表面向下指向，邻近粘合残渣形成的金属板，以及激光发生器 用于将激光照射到金属板上，使得通过从金属板产生的热量去除粘合剂残留物。
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公开(公告)号：US20140345646A1
公开(公告)日：2014-11-27
申请号：US14255557
申请日：2014-04-17
Applicant: AP Systems Inc.
Inventor： Sung Ho Kwak , Min Young Cho
CPC classification number: G03F1/82 , B08B7/0042
Abstract: This invention relates to an apparatus and method for cleaning a photomask. This apparatus, suitable for use in removing an adhesive residue from a photomask, includes a photomask disposed such that a surface thereof on which an adhesive residue is left behind is directed downwards, a metal plate formed adjacent to the adhesive residue, and a laser generator for irradiating a laser onto the metal plate so that the adhesive residue is removed by heat generated from the metal plate.
Abstract translation: 本发明涉及一种清洁光掩模的装置和方法。 适用于从光掩模中去除粘合剂残留物的该装置包括光掩模，该光掩模被设置为使得其上残留有粘合剂残留物的表面向下指向，邻近粘合残渣形成的金属板，以及激光发生器 用于将激光照射到金属板上，使得通过从金属板产生的热量去除粘合剂残留物。
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