Patent search ap:("ASM IP Holding B.V.") AND inv:"Yuki Takahashi" Page 1

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发明申请
SUBSTRATE PROCESSING APPARATUS, BEVEL MASK AND SUBSTRATE PROCESSING METHOD 有权

公开(公告)号：US20210175052A1

公开(公告)日：2021-06-10

申请号：US17109080

申请日：2020-12-01

Applicant: ASM IP Holding B.V.

Inventor： Yuki Takahashi , Dai Ishikawa

IPC: H01J37/32 , H01L21/02

Abstract: Examples of a substrate processing apparatus include a chamber, a shielding component that is a susceptor or an upper cover provided in the chamber, and a bevel mask that is provided in the chamber and has an inclined surface on which a vertical distance from the shielding component increases toward a center side of the shielding component.

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