专利检索 ap:("ASM Lithography B.V.") AND inv:"Jan Van Elp" 第 1 页

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发明申请
Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件

公开(公告)号：US20020097385A1

公开(公告)日：2002-07-25

申请号：US09971769

申请日：2001-10-09

申请人： ASM Lithography B.V.

发明人： Jan Van Elp , Martinus Hendrikus Antonius Leenders , Vadim Yevgenyevich Banine , Hugo Matthieu Visser , Levinus Pieter Bakker

IPC分类号： G03B027/00 , G03F007/00 , G03B027/54

CPC分类号： G03F7/70575 , G03F7/70191 , G03F7/702

摘要： In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.

摘要翻译： 在光刻投影设备中，使用光栅光谱滤波器来过滤EUV投影光束。光栅光谱滤波器优选地是闪耀的，掠入射的反射光栅。冷却通道可以设置在光栅光谱滤波器的背面中或后面。光栅光谱滤波器可以由对期望的辐射有效地不可见的材料形成。