公开(公告)号：US10761435B2

公开(公告)日：2020-09-01

申请号：US16484677

申请日：2018-01-17

Applicant: ASML Holding N.V.

Inventor： Enrico Zordan ,  Brandon Adam Evans ,  Daniel Nathan Burbank ,  Ankur Ramesh Baheti ,  Samir A. Nayfeh

IPC: G03F7/20

Abstract: Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.