公开(公告)号：US20230238211A1

公开(公告)日：2023-07-27

申请号：US18011838

申请日：2021-07-05

Applicant: ASML NETHERLANDS B. V.

Inventor： Marco Jan-Jaco WIELAND ,  Stoyan NIHTIANOV ,  Roy Ramon VEENSTRA ,  Hui JIANG

IPC: H01J37/244 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/244 ,  H01J37/3177 ,  H01J37/1475 ,  H01J37/1477 ,  H01J2237/0453 ,  H01J2237/026

Abstract: A detector substrate (or detector array) for use in a charged particle multi-beam assessment tool to detect charged particles from a sample. The detector substrate defines an array of apertures for beam paths of respective charged particle beams of a multi-beam. The detector substrate includes a sensor unit array. A sensor unit of the sensor unit array is adjacent to a corresponding aperture of the aperture array. The sensor unit is configured to capture charged particles from the sample. The detector array may include an amplification circuit associated with each sensor unit in the sensor unit array and proximate to the corresponding aperture in the aperture array. The amplification circuit may include a Trans Impedance Amplifier and/or an analogue to digital converter.