公开(公告)号：US11835870B2

公开(公告)日：2023-12-05

申请号：US17627720

申请日：2020-06-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Güneş Nak{dot over (i)}boğlu ,  Nicholas Peter Waterson ,  Remco Van De Meerendonk ,  Steve Gregory Brust ,  Dirk Martinus Gerardus Petrus Wilhelmus Jakobs ,  Shravan Kottapalli

IPC: G03F7/00

CPC classification number: G03F7/70891

Abstract: A passive flow induced vibration reduction system for use in a temperature conditioning system that controls the temperature of at least one component within a lithographic apparatus. This FIV reduction system includes: a conduit that provides a flow path for a liquid through the system; a liquid filled cavity in fluid connection with the conduit, wherein the fluid connection is provided via one or more openings in the wall of the conduit; a membrane configured such that it separates the liquid in the liquid filled cavity from a gas at a substantially ambient pressure and the membrane is configured such that compliance of the membrane reduces at least low frequency flow induced vibrations in the liquid flowing through the conduit; and an end-stop located on the gas side of the membrane, wherein the end-stop is configured to limit an extent of deflection of the membrane.