公开(公告)号：US20210302845A1

公开(公告)日：2021-09-30

申请号：US16330417

申请日：2017-08-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Bert VERSTRAETEN ,  HUGO JOSEPH CRAMER AUGUSTINUS ,  THOMAS THEEUWES

IPC: G03F7/20

Abstract: A method of evaluating a patterning process, the method including: obtaining the result of a first measurement of a first metrology target; obtaining the result of a second measurement of a second metrology target, the second metrology target having a structural difference from the first metrology target that generates a sensitivity difference and/or an offset, of a process parameter of the patterning process between the first and second metrology targets; and determining a value pertaining to the patterning process based on the results of the first and second measurements.