公开(公告)号：US20170176867A1

公开(公告)日：2017-06-22

申请号：US15327334

申请日：2015-06-18

Applicant: ASML Netherlands B.V.

Inventor： Daan Daniel Johannes Antonius VAN SOMMEREN ,  Bruno Jean François FRACKOWIAK ,  Arend KOOLMA

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/20 ,  G03F7/2041 ,  H01L21/0274

Abstract: A fluid handling structure, an immersion lithographic apparatus and a device manufacturing method are disclosed. In one arrangement, a fluid handling structure has a fluid extraction conduit with a recovery port configured to receive a used fluid into the conduit. A plurality of flow breakers are provided that each extends across at least a portion of the conduit. The flow breakers are positioned downstream of the recovery port. The flow breakers are arranged so that a common plane cuts through at least a portion of two or more of the flow breakers. The common plane is aligned so as to be perpendicular to the average direction of flow in the conduit at the position of the common plane.