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公开(公告)号：US10372043B2
公开(公告)日：2019-08-06
申请号：US15534391
申请日：2015-12-11
Applicant: ASML Netherlands B.V.
Inventor： Gang Chen , Te-Sheng Wang
IPC: G03F7/20
Abstract: A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: obtaining a relationship of a characteristic of one or more features in the portion with respect to dose; obtaining a value of the characteristic; and obtaining a target dose based on the value of the characteristic and the relationship.
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