公开(公告)号：US11573496B2

公开(公告)日：2023-02-07

申请号：US17458216

申请日：2021-08-26

Applicant: ASML Netherlands B.V.

Inventor： Nick Kant ,  Martijn Cornelis Schaafsma

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system comprising at least one optical component and configured to project a pattern onto a substrate. The lithographic apparatus further comprises a control system arranged to reduce the effects of heating and/or cooling of an optical component in a lithographic process. The control system is configured at least: to select at least one of a plurality of mode shapes to represent a relationship between at least one input in the lithographic process and an aberration resulting from the input and to generate and apply a correction to the lithographic apparatus based on the mode shape.

公开(公告)号：US11126091B2

公开(公告)日：2021-09-21

申请号：US16969078

申请日：2019-01-28

Applicant: ASML Netherlands B.V.

Inventor： Martijn Cornelis Schaafsma ,  Mhamed Akhssay ,  James Robert Downes

IPC: G03B27/54 ,  G03F7/20

Abstract: A method of calibrating a projection system heating model to predict an aberration in a projection system in a lithographic apparatus, the method comprising passing exposure radiation through a projection system to expose one or more exposure fields on a substrate provided on a substrate table, making measurements of the aberration in the projection system caused by the exposure radiation, wherein the time period between measurements is less than the time period that would be taken to expose all exposure fields on the substrate.