公开(公告)号：US20250131552A1

公开(公告)日：2025-04-24

申请号：US18834970

申请日：2023-01-18

Applicant: ASML Netherlands B.V.

Inventor： Shahrzad NAGHIBZADEH ,  Narjes JAVAHERI

IPC: G06T7/00 ,  G03F7/00

Abstract: Disclosed is a method for determining a parameter of interest relating to at least one target on a substrate. The method comprises obtaining metrology data comprising at least one asymmetry signal, said at least one asymmetry signal comprising a difference or imbalance in a measurement parameter from the target; obtaining a trained model having been trained or configured to relate said at least one asymmetry signal to the parameter of interest, the trained model comprising at least one proxy for at least one nuisance component of the at least one asymmetry signal; and inferring said parameter of interest for said at least one target from said at least one asymmetry signal using the trained model.