公开(公告)号：US09959610B2

公开(公告)日：2018-05-01

申请号：US14882122

申请日：2015-10-13

Applicant: Applied Materials, Inc.

Inventor： Leonid M. Tertitski ,  Schubert S. Chu ,  Shay Assaf ,  Kim R. Vellore ,  Zhepeng Cong

IPC: G06T7/00

CPC classification number: G06T7/0004 ,  G06T2207/10024 ,  G06T2207/30148

Abstract: A method and apparatus for detecting substrate misalignment (i.e., position displacement error) and/or substrate support misalignment. According to certain aspects, a method for detecting a misalignment of an object in a processing system is provided. The method generally includes obtaining a first image of the object, determining first values associated with pixels in at least one region of the first image, calculating at least one of a center of gravity value of the pixels in the at least one region or an average weight of the pixels in the at least one region, and detecting a misalignment of the object based on at least one of the calculated center of gravity or average weight of the pixels in the at least one region.