公开(公告)号：US20250037980A1

公开(公告)日：2025-01-30

申请号：US18359772

申请日：2023-07-26

Applicant: Applied Materials, Inc.

Inventor： Rupankar Choudhury ,  Sanjay G. Kamath ,  Juan Carlos Rocha-Alvarez ,  Sridhar Bachu ,  Mukesh Singh Dhami ,  Dan-il Yoon

IPC: H01J37/32 ,  C23C16/44 ,  C23C16/455

Abstract: A processing chamber and port adaptor are provided. Processing chambers include a chamber body having a lid coupled to the first end of the chamber body, a gas ring adjacent the first end of the chamber body, and a substrate support, where a processing region is defined between the substrate support and the lid. The processing chamber includes a port adapter coupled to the second end of the chamber body. The port adapter includes a body defining a plurality of apertures in fluid communication with the processing region, where each of the apertures are spaced apart along the body such that a distance between adjacent apertures is within about 20% of an average aperture spacing distance, an individually controllable valve fluidly coupled to one or more of the plurality of apertures, and an exhaust system in fluid communication with a system foreline and the plurality of apertures.