公开(公告)号：US20200006039A1

公开(公告)日：2020-01-02

申请号：US16023963

申请日：2018-06-29

Applicant: Applied Materials, Inc.

Inventor： Sathyendra GHANTASALA ,  Hyun-Ho DOH ,  Vijayakumar C. VENUGOPAL

IPC: H01J37/32

Abstract: Methods of operating and assembling a plasma chamber are disclosed. An operating method includes tuning a match network of a plasma chamber while running a non-plasma discharge recipe. A hardware impedance of the plasma chamber is calculated from the match network settings from the tuning. A match loss for the plasma chamber is also calculated according to match network settings. A radio frequency (RF) power setting for the first plasma chamber is set according to the calculated hardware impedance and the calculated match loss. Such methods can be utilized to provide chamber-to-chamber performance matching across different plasma chambers. Certain disclosed methods of operating the plasma chamber can be utilized to identify hardware faults during operation and/or assembly processes.