公开(公告)号：US11449711B2

公开(公告)日：2022-09-20

申请号：US16733219

申请日：2020-01-02

Applicant: Applied Materials Israel Ltd.

Inventor： Ran Badanes ,  Ran Schleyen ,  Boaz Cohen ,  Irad Peleg ,  Denis Suhanov ,  Ore Shtalrid

IPC: G06T7/00 ,  G06K9/62

Abstract: There is provided a method of defect detection on a specimen and a system thereof. The method includes: obtaining a runtime image representative of at least a portion of the specimen; processing the runtime image using a supervised model to obtain a first output indicative of the estimated presence of first defects on the runtime image; processing the runtime image using an unsupervised model component to obtain a second output indicative of the estimated presence of second defects on the runtime image; and combining the first output and the second output using one or more optimized parameters to obtain a defect detection result of the specimen.