公开(公告)号：US20230306580A1

公开(公告)日：2023-09-28

申请号：US17706306

申请日：2022-03-28

Applicant: Applied Materials Israel Ltd.

Inventor： Tal BEN-SHLOMO ,  Shalom ELKAYAM ,  Shaul COHEN ,  Tomer PELED

IPC: G06T7/00 ,  G06T7/11

CPC classification number: G06T7/001 ,  G06T7/11 ,  G06T2207/30148 ,  G06T2207/20081

Abstract: There is provided a system and method of runtime examination of a semiconductor specimen. The method includes obtaining a runtime image representative of an inspection area of the specimen, the runtime image having a relatively low signal-to-noise ratio (SNR); and processing the runtime image using a machine learning (ML) model to obtain examination data specific for a given examination application, wherein the ML model is previously trained for the given examination application using one or more training samples, each training sample representative of a respective reference area sharing the same design pattern as the inspection area and comprising: a first training image of the respective reference area having a relatively low SNR; and label data indicative of ground truth in the respective reference area pertaining to the given examination application, the label data obtained by annotating a second training image of the respective reference area having a relatively high SNR.