公开(公告)号：US20250058310A1

公开(公告)日：2025-02-20

申请号：US18723025

申请日：2022-11-10

Applicant: BASF CORPORATION

Inventor： Aleksei VJUNOV ,  Yipeng SUN ,  Kai SCHMITZ ,  Xue LIU ,  Pascaline TRAN ,  Gary A YACOBIAN ,  Amit A GOKHALE ,  Stefan MAURER

IPC: B01J37/02 ,  B01J23/40 ,  B05B1/30

Abstract: Apparatuses and methods for depositing platinum-group metals (PGM) on substrates in a production line. The apparatus may include: at least one movement mechanism configured to move a plurality of substrates through a deposition region of the production line; at least one alignment mechanism configured to align a plurality of deposition units with a portion of the plurality of substrates in the deposition region; and at least one control unit configured to control a flow rate of the PGM through at least one supply line to the aligned plurality of deposition units to deposit the PGM on deposition surfaces of the aligned portion of the plurality of substrates.