公开(公告)号：US20230158440A1

公开(公告)日：2023-05-25

申请号：US17907613

申请日：2021-03-24

Applicant: Edwards Limited

Inventor： Arani Elanganathan ,  Christopher Paul Williams ,  Anna Victoria Howbrook ,  Gareth David Stanton

IPC: B01D49/00 ,  B01D53/34

CPC classification number: B01D49/00 ,  B01D53/346

Abstract: Apparatus and methods are disclosed. The apparatus comprises: an abatement chamber of an abatement apparatus which treats an effluent stream from a semiconductor processing tool to provide a combusted effluent stream having effluent particles; and a first atomiser located downstream of the abatement chamber, the first atomiser being configured to produce droplets having a droplet size based on a particle size of the effluent particles to be removed from the combusted effluent stream. In this way, the atomizer may produce droplets which combine with or adhere to the effluent particles which assists in the removal of the effluent particles from the combusted effluent stream.