公开(公告)号：US20190113469A1

公开(公告)日：2019-04-18

申请号：US15786986

申请日：2017-10-18

Applicant: GLOBALFOUNDRIES INC.

Inventor： Oliver D. Patterson ,  Richard F. Hafer ,  Dave M. Salvador ,  Yue Ke

IPC: G01N23/22 ,  H01J37/21 ,  G01N23/225 ,  H01J37/20

Abstract: A method of inspecting semiconductors and a semiconductor inspection system are disclosed. In an embodiment, the method comprises directing a charged particle beam onto a semiconductor device at an angle in a range between five degrees and eighty-five degrees from a normal to a top surface of the semiconductor; scanning the particle beam across a field of the semiconductor device; adjusting the semiconductor to maintain the particle beam at a defined focus on the semiconductor while scanning the particle beam across the field of the semiconductor device; detecting secondary and backscattered electrons from the semiconductor; and processing the detected secondary and backscattered electrons to inspect for defined conditions of the semiconductor. In an embodiment, the particle beam is maintained at the defined focus on the semiconductor device by controlling the position of the semiconductor device relative to a beam emitter that emits the particle beam.