公开(公告)号：US08894180B2

公开(公告)日：2014-11-25

申请号：US13743521

申请日：2013-01-17

Applicant: Hewlett-Packard Development Company, L.P.

Inventor： Steve A. O'Hara ,  Steven P. Downing ,  Teressa L. Roth ,  Sierra Lynn Triebe ,  Brian Mar

IPC: B41J2/165

CPC classification number: B41J2/16535 ,  B41J2/16517 ,  B41J2/16538 ,  B41J2/16544 ,  B41J2/16547 ,  B41J2/16585 ,  Y10T29/49826

Abstract: A wiping assembly includes a pair of guide elements located at opposite ends of a headland region of a fluid ejection assembly to extend in a second orientation generally perpendicular to a first orientation through which the opposite ends extend. Each guide element includes at least one first portion and a second portion. The at least one first portion selectively receives biased releasable engagement from a non-wiping portion of a wiping element extending along the first orientation to cause a wiping portion of the wiping element to be in generally parallel relation to, and spaced apart from, the headland region. The second portion causes the non-wiping portion to no longer be in biased releasable engagement against the guide element and causes the wiping portion to be biased in wiping relation against the headland region.

Abstract translation: 擦拭组件包括位于流体喷射组件的岬角区域的相对端处的一对引导元件，该引导元件在大致垂直于相对端延伸穿过的第一定向的第二取向中延伸。 每个引导元件包括至少一个第一部分和第二部分。 所述至少一个第一部分选择性地接收来自沿着所述第一取向延伸的擦拭元件的非擦拭部分的偏置的可释放接合，以使所述擦拭元件的擦拭部分大致平行于所述岬角 地区。 第二部分使得非擦拭部分不再与导向元件偏置可释放地接合，并且使得擦拭部分被偏置成与岬角区域擦拭的关系。

公开(公告)号：US20140198155A1

公开(公告)日：2014-07-17

申请号：US13743521

申请日：2013-01-17

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.

Inventor： Steve A. O'Hara ,  Steven P. Downing ,  Teressa L. Roth ,  Sierra Lynn Triebe ,  Brian Mar

IPC: B41J2/165 ,  B23P11/00

CPC classification number: B41J2/16535 ,  B41J2/16517 ,  B41J2/16538 ,  B41J2/16544 ,  B41J2/16547 ,  B41J2/16585 ,  Y10T29/49826

Abstract: A wiping assembly includes a pair of guide elements located at opposite ends of a headland region of a fluid ejection assembly to extend in a second orientation generally perpendicular to a first orientation through which the opposite ends extend. Each guide element includes at least one first portion and a second portion. The at least one first portion selectively receives biased releasable engagement from a non-wiping portion of a wiping element extending along the first orientation to cause a wiping portion of the wiping element to be in generally parallel relation to, and spaced apart from, the headland region. The second portion causes the non-wiping portion to no longer be in biased releasable engagement against the guide element and causes the wiping portion to be biased in wiping relation against the headland region.

Abstract translation: 擦拭组件包括一对引导元件，该引导元件位于流体喷射组件的岬角区域的相对端处，以大致垂直于相对端延伸穿过的第一定向的第二取向延伸。 每个引导元件包括至少一个第一部分和第二部分。 所述至少一个第一部分选择性地接收来自沿着所述第一取向延伸的擦拭元件的非擦拭部分的偏置的可释放接合，以使所述擦拭元件的擦拭部分大致平行于所述岬角 地区。 第二部分使得非擦拭部分不再与导向元件偏置可释放地接合，并且使得擦拭部分被偏置成与岬角区域擦拭的关系。