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公开(公告)号:US5096735A
公开(公告)日:1992-03-17
申请号:US656427
申请日:1991-02-05
申请人: Hiroaki Nakaya , Takuo Yamashita , Takashi Ogura , Kouji Tanaguchi , Koichi Tanaka , Akiyoshi Mikami , Katsushi Okibayashi , Kousuke Terada
发明人: Hiroaki Nakaya , Takuo Yamashita , Takashi Ogura , Kouji Tanaguchi , Koichi Tanaka , Akiyoshi Mikami , Katsushi Okibayashi , Kousuke Terada
CPC分类号: H01L33/0087 , H05B33/10
摘要: Disclosed is an improvement of a process for producing a thin film electroluminescent device wherein the luminescent film is formed by a CVD method. The improvement residues in that an unnecessary portion of the luminescent layer, which is inherently formed if the CVD method is employed, is removed by etching.
摘要翻译: 披露了通过CVD法形成发光膜的薄膜电致发光器件的制造方法的改进。 如果使用CVD法固有地形成的发光层的不需要部分的改进残留物通过蚀刻被去除。