Semiconductor device having a thin-film circuit element provided above an integrated circuit
    3.
    再颁专利
    Semiconductor device having a thin-film circuit element provided above an integrated circuit 失效
    具有设置在集成电路上方的薄膜电路元件的半导体器件

    公开(公告)号:USRE41511E1

    公开(公告)日:2010-08-17

    申请号:US11726763

    申请日:2007-03-22

    IPC分类号: H01L23/522 H01L23/50

    摘要: In a semiconductor device, re-wiring is provided on a circuit element formation region of a semiconductor substrate. A columnar electrode for connection with a circuit board is provided on the rewiring. A first insulating film is provided over the semiconductor substrate excluding a connection pad, and a ground potential layer connected to a ground potential is provided on an upper surface of the first insulating film. A re-wiring is provided over the ground potential layer with a second insulating film interposed. The ground potential layer serves as a barrier layer for preventing crosstalk between the re-wiring and circuit element formation region. A thin-film circuit element is provided on the second insulating film, and a second ground potential layer is provided as a second barrier layer over the thin-film circuit element with an insulating film interposed. Re-wiring is provided over the second ground potential layer.

    摘要翻译: 在半导体器件中,在半导体衬底的电路元件形成区域上设置再布线。 在重新布线时提供用于与电路板连接的柱状电极。 第一绝缘膜设置在除了连接焊盘之外的半导体衬底上,并且在第一绝缘膜的上表面上设置连接到接地电位的接地电位层。 在地电位层上提供再布线,其中插入有第二绝缘膜。 地电位层用作防止重新布线和电路元件形成区域之间的串扰的阻挡层。 薄膜电路元件设置在第二绝缘膜上,第二接地电位层设置在薄膜电路元件上,作为第二阻挡层,绝缘膜被插入。 在第二接地电位层上提供重新布线。

    IMAGING APPARATUS HAVING PHOTOSENSOR AND MANUFACTURING METHOD OF THE SAME
    8.
    发明申请
    IMAGING APPARATUS HAVING PHOTOSENSOR AND MANUFACTURING METHOD OF THE SAME 失效
    具有光电传感器的成像装置及其制造方法

    公开(公告)号:US20110291212A1

    公开(公告)日:2011-12-01

    申请号:US13115348

    申请日:2011-05-25

    IPC分类号: H01L31/0232 H01L31/18

    摘要: A photosensor comprises a photoelectric conversion device region and a connection pad on the lower surface of a semiconductor substrate, and also comprises a wiring line connected to the connection pad via insulating film under the semiconductor substrate, and a columnar electrode as an external connection electrode connected to the wiring line. As a result, as compared with the case where the photoelectric conversion device region and the connection pad connected to the photoelectric conversion device region are formed on the upper surface of the semiconductor substrate, a piercing electrode for connecting the connection pad and the wiring line does not have to be formed in the semiconductor substrate. Thus, the number of steps can be smaller, and a fabrication process can be less restricted.

    摘要翻译: 光电传感器包括在半导体衬底的下表面上的光电转换器件区域和连接焊盘,并且还包括通过半导体衬底下的绝缘膜连接到连接焊盘的布线和连接到外部连接电极的柱状电极 到接线。 结果,与在半导体衬底的上表面上形成光电转换元件区域和与光电转换元件区域连接的连接焊盘的情况相比,用于连接连接焊盘和布线的穿孔电极 不必在半导体衬底中形成。 因此,步数可以更小,并且制造过程可以较少受限制。