公开(公告)号：US20250104911A1

公开(公告)日：2025-03-27

申请号：US18474735

申请日：2023-09-26

Applicant: Intel Corporation

Inventor： Jaeil Baek ,  Brandon Christian Marin ,  Beomseok Choi ,  Kaladhar Radhakrishnan

IPC: H01F41/04 ,  H01L23/498 ,  H01L23/64

Abstract: Coaxial metal inductor loops and associated methods are disclosed. An example apparatus includes a substrate, first conductive material disposed along a first hole extending through the substrate, second conductive material disposed along a second hole extending through the substrate, and a magnetic material defining a continuous path completely encompassing both the first conductive material and the second conductive material in a plane perpendicular to an axis of the first hole.