公开(公告)号：US11735531B2

公开(公告)日：2023-08-22

申请号：US17374886

申请日：2021-07-13

Applicant: Intel Corporation

Inventor： Srinivas V. Pietambaram ,  Sri Ranga Sai Boyapati ,  Robert A. May ,  Kristof Darmawikarta ,  Javier Soto Gonzalez ,  Kwangmo Lim

IPC: H01L23/538 ,  H01L23/00

CPC classification number: H01L23/5389 ,  H01L23/00 ,  H01L24/06 ,  H01L2224/04105 ,  H01L2224/18 ,  H01L2224/24137 ,  H01L2924/18162

Abstract: A foundation layer and methods of forming a conductive via are described. A die pad is formed over a die. A seed layer is deposited over the die pad and the foundation layer. A first photoresist layer is deposited over the seed layer, and the first layer is patterned to form a conductive line opening over the die pad. A conductive material is deposited into the conductive line opening to form a conductive line. A second photoresist layer is deposited over the first layer, and the second layer is patterned to form a via opening over the conductive line. The conductive material is deposited into the via opening to form the conductive via, where the conductive material only deposits on portions of exposed conductive line. The second and first layers are removed. Portions of exposed seed layer are recessed, and then a top surface of the conductive via is exposed.

公开(公告)号：US12218071B2

公开(公告)日：2025-02-04

申请号：US18208785

申请日：2023-06-12

Applicant: Intel Corporation

Inventor： Srinivas V. Pietambaram ,  Sri Ranga Sai Boyapati ,  Robert A. May ,  Kristof Darmawikarta ,  Javier Soto Gonzalez ,  Kwangmo Lim

IPC: H01L23/538 ,  H01L23/00

Abstract: A foundation layer and methods of forming a conductive via are described. A die pad is formed over a die. A seed layer is deposited over the die pad and the foundation layer. A first photoresist layer is deposited over the seed layer, and the first layer is patterned to form a conductive line opening over the die pad. A conductive material is deposited into the conductive line opening to form a conductive line. A second photoresist layer is deposited over the first layer, and the second layer is patterned to form a via opening over the conductive line. The conductive material is deposited into the via opening to form the conductive via, where the conductive material only deposits on portions of exposed conductive line. The second and first layers are removed. Portions of exposed seed layer are recessed, and then a top surface of the conductive via is exposed.

公开(公告)号：US11101222B2

公开(公告)日：2021-08-24

申请号：US16326679

申请日：2016-09-29

Applicant: Intel Corporation

Inventor： Srinivas V. Pietambaram ,  Sri Ranga Sai Boyapati ,  Robert A. May ,  Kristof Darmawikarta ,  Javier Soto Gonzalez ,  Kwangmo Lim

IPC: H01L23/538 ,  H01L23/00

Abstract: A foundation layer and methods of forming a conductive via are described. A die pad is formed over a die. A seed layer is deposited over the die pad and the foundation layer. A first photoresist layer is deposited over the seed layer, and the first layer is patterned to form a conductive line opening over the die pad. A conductive material is deposited into the conductive line opening to form a conductive line. A second photoresist layer is deposited over the first layer, and the second layer is patterned to form a via opening over the conductive line. The conductive material is deposited into the via opening to form the conductive via, where the conductive material only deposits on portions of exposed conductive line. The second and first layers are removed. Portions of exposed seed layer are recessed, and then a top surface of the conductive via is exposed.