公开(公告)号：US20200013638A1

公开(公告)日：2020-01-09

申请号：US16495368

申请日：2018-02-05

Applicant: KCTECH CO., LTD.

Inventor： Kang il CHO

IPC: H01L21/677 ,  H01L21/687 ,  H01L21/683

Abstract: The present invention relates to a substrate processing apparatus, wherein the substrate processing apparatus for coating chemical liquid on a substrate comprises: a substrate support for supporting a substrate, a chemical liquid coating unit for applying and coating the chemical liquid to the substrate, and a preliminary drying unit for preliminarily drying chemical liquid in a state supported by the substrate support whereby it is possible to obtain the effect of preventing the chemical liquid from flowing down and forming a chemical liquid coating film of uniform thickness.