公开(公告)号：US10262408B2

公开(公告)日：2019-04-16

申请号：US15683631

申请日：2017-08-22

Applicant: KLA-Tencor Corporation

Inventor： Allen Park ,  Moshe Preil ,  Andrew James Cross

IPC: G06T7/00 ,  G06K9/62

Abstract: A system, method, and computer program product are provided for systematic and stochastic characterization of pattern defects identified from a fabricated component. In use, a plurality of pattern defects detected from a fabricated component are identified. Additionally, attributes of each of the pattern defects are analyzed, based on predefined criteria. Further, a first set of pattern defects of the plurality of pattern defects are determined, from the analysis, to be systematic pattern defects, and a second set of pattern defects of the plurality of pattern defects are determined, from the analysis, to be stochastic pattern defects. Moreover, a first action is performed for the determined systematic pattern defects and a second action is performed for the determined stochastic pattern defects.

公开(公告)号：US20180300870A1

公开(公告)日：2018-10-18

申请号：US15683631

申请日：2017-08-22

Applicant: KLA-Tencor Corporation

Inventor： Allen Park ,  Moshe Preil ,  Andrew James Cross

IPC: G06T7/00 ,  G06K9/62

CPC classification number: G06T7/0004 ,  G06K9/6201 ,  G06T2207/30148

Abstract: A system, method, and computer program product are provided for systematic and stochastic characterization of pattern defects identified from a fabricated component. In use, a plurality of pattern defects detected from a fabricated component are identified. Additionally, attributes of each of the pattern defects are analyzed, based on predefined criteria. Further, a first set of pattern defects of the plurality of pattern defects are determined, from the analysis, to be systematic pattern defects, and a second set of pattern defects of the plurality of pattern defects are determined, from the analysis, to be stochastic pattern defects. Moreover, a first action is performed for the determined systematic pattern defects and a second action is performed for the determined stochastic pattern defects.