公开(公告)号：US10726169B2

公开(公告)日：2020-07-28

申请号：US14919954

申请日：2015-10-22

Applicant: KLA-Tencor Corporation

Inventor： Michael E. Adel ,  Nuriel Amir ,  Mark Ghinovker ,  Tal Shusterman ,  David Gready ,  Sergey Borodyansky

IPC: G06F30/20

Abstract: Systems and method are provided for analyzing target, process and metrology configuration sensitivities to a wide range of parameters, according to external requirements or inner development and verification needs. Systems comprise the following elements. An input module is arranged to receive parameters relating to targets, target metrology conditions and production processes, to generate target data. A metrology simulation unit is arranged to simulate metrology measurements of targets from the target data and to generate multiple metrics that quantify the simulated target measurements. A sensitivity analysis module is arranged to derive functional dependencies of the metrics on the parameters and to define required uncertainties of the parameters with respect to the derived functional dependencies. Finally, a target optimization module is arranged to rank targets and target metrology conditions with respect to the simulated target measurements.

公开(公告)号：US20160042105A1

公开(公告)日：2016-02-11

申请号：US14919954

申请日：2015-10-22

Applicant: KLA-Tencor Corporation

Inventor： Michael E. Adel ,  Nuriel Amir ,  Mark Ghinovker ,  Tal Shusterman ,  David Gready ,  Sergey Borodyansky

IPC: G06F17/50

Abstract: Systems and method are provided for analyzing target, process and metrology configuration sensitivities to a wide range of parameters, according to external requirements or inner development and verification needs. Systems comprise the following elements. An input module is arranged to receive parameters relating to targets, target metrology conditions and production processes, to generate target data. A metrology simulation unit is arranged to simulate metrology measurements of targets from the target data and to generate multiple metrics that quantify the simulated target measurements. A sensitivity analysis module is arranged to derive functional dependencies of the metrics on the parameters and to define required uncertainties of the parameters with respect to the derived functional dependencies. Finally, a target optimization module is arranged to rank targets and target metrology conditions with respect to the simulated target measurements.

Abstract translation: 提供系统和方法，根据外部要求或内部开发和验证需求，将目标，过程和度量配置灵敏度分析到广泛的参数。 系统包括以下要素。 输入模块被布置成接收与目标相关的参数，目标计量条件和生产过程，以产生目标数据。 计量模拟单元被设置为模拟来自目标数据的目标的度量测量并且生成量化模拟目标测量的多个度量。 灵敏度分析模块被布置为导出度量对参数的功能依赖性并且相对于导出的功能依赖性来定义参数的所需不确定性。 最后，设置目标优化模块以对目标和目标计量条件进行相对于模拟目标测量的排序。