公开(公告)号：US20230037147A1

公开(公告)日：2023-02-02

申请号：US17574764

申请日：2022-01-13

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Dong Ick SON ,  Dong Hee PARK ,  Joo Song LEE

IPC: C25B11/052 ,  H01B1/02 ,  C25B11/091 ,  C25B11/056 ,  C25B1/55 ,  C25B11/065 ,  C25B1/04

Abstract: Disclosed are a photoelectrochemical electrode and a method of manufacturing the same, which enable mass production at low cost. The photoelectrochemical electrode manufactured by forming a transition metal dichalcogenide layer on all or part of the surface of a porous substrate includes a porous substrate and a metal dichalcogenide layer on all or part of the surface of the porous substrate, thus improving photoelectrode characteristics and photocatalytic efficiency.

公开(公告)号：US20160054476A1

公开(公告)日：2016-02-25

申请号：US14825881

申请日：2015-08-13

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Won Kook CHOI ,  Dong Hee PARK ,  Chang Hwan WIE ,  Do Kyung HWANG

IPC: G02B1/115

CPC classification number: G02B1/115 ,  G02B1/118 ,  Y10T428/24413

Abstract: Provided are an anti-reflection nano-coating structure and a method of manufacturing the same. The anti-reflection nano-coating structure has low dependency on incident light. The anti-reflection nano-coating structure has a normal-align nano-structure on the entire surface of the substrate regardless of curvature of the substrate by controlling a ratio of reactive gas during sputtering.

Abstract translation: 提供一种抗反射纳米涂层结构及其制造方法。 抗反射纳米涂层结构对入射光的依赖性低。 防反射纳米涂层结构通过控制溅射期间的反应气体的比例而在衬底的整个表面上具有正常对准的纳米结构，而不管衬底的曲率。