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公开(公告)号:US20220142021A1
公开(公告)日:2022-05-05
申请号:US17579163
申请日:2022-01-19
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor: Ho-Koang CHOI , Byung Joon MOON , Dong Su LEE , Sukang BAE , Seoung-Ki LEE , Sang Hyun LEE , Tae-Wook KIM
Abstract: Provided is a method for manufacturing an electromagnetic interference shielding film comprising an electromagnetic interference shielding layer, the method comprising the steps of: preparing a metal nanoplate solution comprising a solvent in which metal nanoplates are dispersed; and coating the metal nanoplate solution on a substrate.
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公开(公告)号:US20200163261A1
公开(公告)日:2020-05-21
申请号:US16630104
申请日:2018-12-24
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor: Ho-Koang CHOI , Byung Joon MOON , Dong Su LEE , Sukang BAE , Seoung-Ki LEE , Sang Hyun LEE , Tae-Wook KIM
Abstract: Provided is a method for manufacturing an electromagnetic interference shielding film comprising an electromagnetic interference shielding layer, the method comprising the steps of: preparing a metal nanoplate solution comprising a solvent in which metal nanoplates are dispersed; and coating the metal nanoplate solution on a substrate.
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