EVAPORATION SUPPLY APPARATUS FOR RAW MATERIAL AND AUTOMATIC PRESSURE REGULATING DEVICE USED THEREWITH
    1.
    发明申请
    EVAPORATION SUPPLY APPARATUS FOR RAW MATERIAL AND AUTOMATIC PRESSURE REGULATING DEVICE USED THEREWITH 有权
    用于原材料和自动压力调节装置的蒸发供应装置

    公开(公告)号:US20100012026A1

    公开(公告)日:2010-01-21

    申请号:US12306904

    申请日:2007-06-13

    IPC分类号: C23C16/52 F16K17/38

    摘要: An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G0, made up of raw material vapor G4 and carrier gas G1, an automatic pressure regulating device that regulates a control valve based on the detected values of the pressure and temperature of mixed gas G0 to regulate the cross-sectional area of the passage through which the mixed gas G0 is distributed so as to hold the pressure of the mixed gas G0 inside the source tank constant; and a constant-temperature heating unit for heating the source tank to a set temperature, in which mixed gas G0 is supplied to a process chamber while controlling the pressure inside the source tank.

    摘要翻译: 用于半导体制造的原料的蒸发供给装置包括:原料汇集在其中的源罐; 流量控制装置,其以规定的流量将载气供给到所述源罐; 用于供给由原料蒸气G4和载气G1组成的混合气体G0的主要管路,基于混合气体G0的压力和温度的检测值来调节控制阀的自动调压装置,以调节十字 混合气体G0通过其分配的通道的截面积,以将混合气体G0的压力保持在源箱内部恒定; 以及用于将源罐加热到设定温度的恒温加热单元,其中将混合气体G0供给到处理室,同时控制源罐内的压力。

    Evaporation supply apparatus for raw material and automatic pressure regulating device used therewith
    2.
    发明授权
    Evaporation supply apparatus for raw material and automatic pressure regulating device used therewith 有权
    用于原材料的蒸发供应装置和使用的自动压力调节装置

    公开(公告)号:US08047510B2

    公开(公告)日:2011-11-01

    申请号:US12306904

    申请日:2007-06-13

    IPC分类号: B01F3/04

    摘要: An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G0, made up of raw material vapor G4 and carrier gas G1, an automatic pressure regulating device that regulates a control valve based on the detected values of the pressure and temperature of mixed gas G0 to regulate the cross-sectional area of the passage through which the mixed gas G0 is distributed so as to hold the pressure of the mixed gas G0 inside the source tank constant; and a constant-temperature heating unit for heating the source tank to a set temperature, in which mixed gas G0 is supplied to a process chamber while controlling the pressure inside the source tank.

    摘要翻译: 用于半导体制造的原料的蒸发供给装置包括:原料汇集在其中的源罐; 流量控制装置,其以规定的流量将载气供给到所述源罐; 用于供给由原料蒸气G4和载气G1组成的混合气体G0的主要管路,基于混合气体G0的压力和温度的检测值来调节控制阀的自动调压装置,以调节十字 混合气体G0通过其分配的通道的截面积,以将混合气体G0的压力保持在源箱内部恒定; 以及用于将源罐加热到设定温度的恒温加热单元,其中将混合气体G0供给到处理室,同时控制源罐内的压力。

    Piezoelectrically Driven Valve and Piezoelectrically Driven Flow Rate Control Device
    5.
    发明申请
    Piezoelectrically Driven Valve and Piezoelectrically Driven Flow Rate Control Device 有权
    压电驱动阀和压电驱动流量控制装置

    公开(公告)号:US20120273061A1

    公开(公告)日:2012-11-01

    申请号:US13505620

    申请日:2010-11-04

    IPC分类号: F16K49/00 F16K31/02

    摘要: A piezoelectrically driven valve and a piezoelectrically driven fluid control device are provided that may control a fluid even if the temperature of the fluid is higher than an operating temperature range of a piezoelectric actuator. The piezoelectrically driven valve includes a valve element for opening and closing a fluid passage, a piezoelectric actuator for driving the valve element by utilizing extension of a piezoelectric element, and a radiation spacer that lifts and supports the piezoelectric actuator away from the fluid passage, and radiates heat that is transferred from fluid flowing in the fluid passage to the piezoelectric actuator, and preferably further includes a support cylinder that houses and supports both of the piezoelectric actuator and the radiation spacer, wherein the support cylinder is made of a material with the same thermal expansion coefficient as that of the radiation spacer, at least at a portion for housing the radiation spacer.

    摘要翻译: 提供了一种压电驱动阀和压电驱动的流体控制装置,其可以控制流体,即使流体的温度高于压电致动器的工作温度范围。 压电驱动阀包括用于打开和关闭流体通道的阀元件,通过利用压电元件的延伸来驱动阀元件的压电致动器,以及将压电致动器提升和支撑远离流体通道的辐射间隔件,以及 辐射从在流体通道中流动的流体转移到压电致动器的热量,并且优选地还包括容纳和支撑压电致动器和辐射间隔物的支撑筒,其中支撑筒由具有相同材料的材料制成 至少在用于容纳辐射间隔物的部分处,与辐射间隔物的热膨胀系数相同。

    Piezoelectrically driven valve and piezoelectrically driven flow rate control device
    6.
    发明授权
    Piezoelectrically driven valve and piezoelectrically driven flow rate control device 有权
    压电阀和压电驱动流量控制装置

    公开(公告)号:US09163743B2

    公开(公告)日:2015-10-20

    申请号:US13505620

    申请日:2010-11-04

    摘要: A piezoelectrically driven valve and a piezoelectrically driven fluid control device are provided that may control a fluid even if the temperature of the fluid is higher than an operating temperature range of a piezoelectric actuator. The piezoelectrically driven valve includes a valve element for opening and closing a fluid passage, a piezoelectric actuator for driving the valve element by utilizing extension of a piezoelectric element, and a radiation spacer that lifts and supports the piezoelectric actuator away from the fluid passage, and radiates heat that is transferred from fluid flowing in the fluid passage to the piezoelectric actuator, and preferably further includes a support cylinder that houses and supports both of the piezoelectric actuator and the radiation spacer, wherein the support cylinder is made of a material with the same thermal expansion coefficient as that of the radiation spacer, at least at a portion for housing the radiation spacer.

    摘要翻译: 提供了一种压电驱动阀和压电驱动的流体控制装置,其可以控制流体,即使流体的温度高于压电致动器的工作温度范围。 压电驱动阀包括用于打开和关闭流体通道的阀元件,通过利用压电元件的延伸来驱动阀元件的压电致动器,以及将压电致动器提升和支撑远离流体通道的辐射间隔件,以及 辐射从在流体通道中流动的流体转移到压电致动器的热量,并且优选地还包括容纳和支撑压电致动器和辐射间隔物的支撑筒,其中支撑筒由具有相同材料的材料制成 至少在用于容纳辐射间隔物的部分处,与辐射间隔物的热膨胀系数相同。

    Method for detecting abnormality in fluid supply line using fluid control apparatus with pressure sensor
    9.
    发明授权
    Method for detecting abnormality in fluid supply line using fluid control apparatus with pressure sensor 有权
    使用带压力传感器的流体控制装置检测流体供应管线异常的方法

    公开(公告)号:US07945414B2

    公开(公告)日:2011-05-17

    申请号:US12065438

    申请日:2006-08-28

    IPC分类号: G06F3/48

    摘要: A method for detecting abnormality in a fluid supply line is provided that uses a fluid control apparatus with a pressure sensor so that abnormality of malfunction and sheet leaks of a plurality of valves incorporated into the fluid supply line can be checked easily, promptly and accurately by operating the flow rate control apparatus possessing the pressure sensor. Specifically, using a fluid supply line provided with the flow rate control apparatus possessing the pressure sensor equipped with a flow rate setting mechanism, a flow rate/pressure display mechanism, and/or a flow rate self-diagnosis mechanism, abnormality of the control valves, installed with the flow rate control apparatus and on the upstream side and downstream side thereof, is detected by using the pressure value displayed and/or the value diagnosed with a self-diagnosis mechanism of the flow rate control apparatus.

    摘要翻译: 提供了一种用于检测流体供应管线中的异常的方法,其使用具有压力传感器的流体控制装置,使得能够容易地,迅速和准确地检查结合到流体供应管线中的多个阀的故障和片材泄漏的异常 操作具有压力传感器的流量控制装置。 具体而言,使用设有具有流量设定机构,流量/压力显示机构和/或流量自诊断机构的压力传感器的流量控制装置的流体供给管线,控制阀的异常 通过使用显示的压力值和/或用流量控制装置的自诊断机构诊断的值来检测安装有流量控制装置并且在其上游侧和下游侧。

    METHOD FOR DETECTING ABNORMALITY IN FLUID SUPPLY LINE USING FLUID CONTROL APPARATUS WITH PRESSURE SENSOR
    10.
    发明申请
    METHOD FOR DETECTING ABNORMALITY IN FLUID SUPPLY LINE USING FLUID CONTROL APPARATUS WITH PRESSURE SENSOR 有权
    使用压力传感器的流体控制装置检测流体输送管线异常的方法

    公开(公告)号:US20090326719A1

    公开(公告)日:2009-12-31

    申请号:US12065438

    申请日:2006-08-28

    IPC分类号: G05D7/06 G06F3/048

    摘要: A method for detecting abnormality in a fluid supply line is provided that uses a fluid control apparatus with a pressure sensor so that abnormality of malfunction and sheet leaks of a plurality of valves incorporated into the fluid supply line can be checked easily, promptly and accurately by operating the flow rate control apparatus possessing the pressure sensor. Specifically, using a fluid supply line provided with the flow rate control apparatus possessing the pressure sensor equipped with a flow rate setting mechanism, a flow rate/pressure display mechanism, and/or a flow rate self-diagnosis mechanism, abnormality of the control valves, installed with the flow rate control apparatus and on the upstream side and downstream side thereof. is detected by using the pressure value displayed and/or the value diagnosed with a self-diagnosis mechanism of the flow rate control apparatus.

    摘要翻译: 提供了一种用于检测流体供应管线中的异常的方法,其使用具有压力传感器的流体控制装置,使得能够容易地,迅速和准确地检查结合到流体供应管线中的多个阀的故障和片材泄漏的异常 操作具有压力传感器的流量控制装置。 具体而言,使用设有具有流量设定机构,流量/压力显示机构和/或流量自诊断机构的压力传感器的流量控制装置的流体供给管线,控制阀的异常 安装有流量控制装置,并且在其上游侧和下游侧。 通过使用显示的压力值和/或用流量控制装置的自诊断机构诊断的值来检测。