LAVATORY WITH HIDDEN DRAIN
    1.
    发明申请

    公开(公告)号:US20210254319A1

    公开(公告)日:2021-08-19

    申请号:US17307156

    申请日:2021-05-04

    Applicant: Kohler Co.

    Abstract: A lavatory includes a basin including a bottom surface, the basin configured to hold a volume of water; and a drain opening disposed in the bottom surface of the basin. The bottom surface of the basin includes a substantially horizontally extending projection formed integrally with the bottom surface of the basin. The horizontally extending projection is disposed over the drain opening such that the drain opening is at least partially obscured from a view of a user.

    Lavatory with hidden drain
    2.
    发明授权

    公开(公告)号:US12281467B2

    公开(公告)日:2025-04-22

    申请号:US17307156

    申请日:2021-05-04

    Applicant: Kohler Co.

    Abstract: A lavatory includes a basin including a bottom surface, the basin configured to hold a volume of water; and a drain opening disposed in the bottom surface of the basin. The bottom surface of the basin includes a substantially horizontally extending projection formed integrally with the bottom surface of the basin. The horizontally extending projection is disposed over the drain opening such that the drain opening is at least partially obscured from a view of a user.

    Lavatory with hidden drain
    3.
    发明授权

    公开(公告)号:US11001995B2

    公开(公告)日:2021-05-11

    申请号:US16392249

    申请日:2019-04-23

    Applicant: Kohler Co.

    Abstract: A lavatory includes a basin including a bottom surface, the basin configured to hold a volume of water; and a drain opening disposed in the bottom surface of the basin. The bottom surface of the basin includes a substantially horizontally extending projection formed integrally with the bottom surface of the basin. The horizontally extending projection is disposed over the drain opening such that the drain opening is at least partially obscured from a view of a user.

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