公开(公告)号：US20220127662A1

公开(公告)日：2022-04-28

申请号：US17510690

申请日：2021-10-26

Applicant: Korea Advanced Institute of Science and Technology

Inventor： Jae-Byum Chang ,  Jueun Sim

IPC: C12Q1/6806 ,  C12Q1/6869

Abstract: Provided are the nucleic acid-mediated pattern replication and a method of manufacturing a 2-D material using the same. A method of manufacturing a 2-D material according to an embodiment may include preparing a first material having a first nucleic acid patterned on a surface thereof, bonding a linker-nucleic acid to the first nucleic acid, bonding the first nucleic acid and a second nucleic acid attached to a surface of a second material through the linker-nucleic acid and replicating a pattern of the first material to the surface of the second material, separating the first material, and applying a third material on a pattern replicated to the surface of the second material.