公开(公告)号：US20040125313A1

公开(公告)日：2004-07-01

申请号：US10725055

申请日：2003-12-02

Applicant: LG.PHILIPS LCD CO., LTD.

Inventor： Byoung Ho Lim

IPC: G02F001/1345

CPC classification number: G02F1/136286 ,  G02F1/13458 ,  G02F2001/136231 ,  G02F2001/136236 ,  G02F2001/136295 ,  Y10S438/951

Abstract: A method of fabricating a liquid crystal display device includes forming a gate electrode, a gate bus line, and a gate pad on a substrate using a first mask process, forming a gate insulating layer and an active layer on an entire surface of the substrate, forming a first organic material film on an entire surface of the substrate, removing a portion of the first organic material film to expose a first portion of the gate pad, depositing a transparent film on an entire surface of the substrate, patterning the transparent film using a second half-tone mask to form a data bus line, a source electrode, a drain electrode, a pixel electrode, a channel layer, and an ohmic contact layer, exposing portions of the data pad and data bus line using a third mask, forming a second organic material film on an entire surface of the substrate, depositing a low resistance material on the data bus line, coating a passivation film on the substrate, removing the second organic material film using a lift-off process to expose a second portion of the gate pad and a first portions of the data pad.

Abstract translation: 一种制造液晶显示装置的方法包括：使用第一掩模工艺在衬底上形成栅电极，栅极总线和栅极焊盘，在衬底的整个表面上形成栅极绝缘层和有源层， 在所述基板的整个表面上形成第一有机材料膜，去除所述第一有机材料膜的一部分以露出所述栅极焊盘的第一部分，在所述基板的整个表面上沉积透明膜，使用 形成数据总线的第二半色调掩模，源电极，漏电极，像素电极，沟道层和欧姆接触层，使用第三掩模曝光数据焊盘和数据总线的部分， 在所述基板的整个表面上形成第二有机材料膜，在所述数据总线上沉积低电阻材料，在所述基板上涂覆钝化膜，使用电梯o移除所述第二有机材料膜 ff处理以暴露栅极焊盘的第二部分和数据焊盘的第一部分。