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    Radiation-sensitive composition
    1.
    发明授权
    Radiation-sensitive composition 失效
    辐射敏感组合物

    公开(公告)号：US5332650A

    公开(公告)日：1994-07-26

    申请号：US941264

    申请日：1992-09-04

    申请人： Makoto Murata ,  Mikio Yamachika ,  Yoshiji Yumoto ,  Takao Miura

    发明人： Makoto Murata ,  Mikio Yamachika ,  Yoshiji Yumoto ,  Takao Miura

    IPC分类号： G03F7/039 ,  G03F7/004 ,  G03C1/52 ,  G03F7/023

    CPC分类号： G03F7/039 ,  Y10S430/111 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/126

    摘要： A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1): ##STR1## wherein R.sup.1 represents a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.2 represents --OR.sup.3 or --NR.sup.4 R.sup.5 in which R.sup.3 is a hydrogen atom, a straight-chain alkyl group, a cyclic alkyl group, an aryl group, an aralkyl group, a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.4 and R.sup.5 which may be the same or different, are hydrogen atoms, straight-chain alkyl groups, cyclic alkyl groups, aralkyl groups or aryl groups, and (B) a radiation-sensitive acid forming agent. Said radiation-sensitive composition can be suitably used as a resist composition which enables reliable fine processing, which has high sensitivity and high resolution degree, and which is superior in dry etching resistance, developability, adhesiveness, heat resistance and yield of residual film thickness.

    摘要翻译： 一种辐射敏感性组合物，其包含（A）具有由式（1）表示的重复单元的聚合物：其中R1表示取代的甲基，取代的乙基，甲硅烷基，甲锗烷基或 烷氧基羰基，R 2表示-OR 3或-NR 4 R 5，其中R 3为氢原子，直链烷基，环烷基，芳基，芳烷基，取代甲基，取代乙基， 甲硅烷基，甲锗烷基或烷氧基羰基，R 4和R 5可以相同或不同，为氢原子，直链烷基，环烷基，芳烷基或芳基，（B） 敏感的酸成型剂。 所述辐射敏感性组合物可以适当地用作能够进行可靠的精细加工的抗蚀剂组合物，其具有高灵敏度和高分辨度，并且其耐干蚀刻性，显影性，粘合性，耐热性和残留膜厚度的产率优异。

    Radiation-sensitive composition
    2.
    发明授权
    Radiation-sensitive composition 失效
    辐射敏感组合物

    公开(公告)号：US5482816A

    公开(公告)日：1996-01-09

    申请号：US263421

    申请日：1994-06-21

    申请人： Makoto Murata ,  Mikio Yamachika ,  Yoshiji Yumoto ,  Takao Miura

    发明人： Makoto Murata ,  Mikio Yamachika ,  Yoshiji Yumoto ,  Takao Miura

    IPC分类号： G03F7/039 ,  G03F7/004 ,  G03C1/52 ,  G03F7/023

    CPC分类号： G03F7/039 ,  Y10S430/111 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/126

    摘要： A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1): ##STR1## wherein R.sup.1 represents a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.2 represents --OR.sup.3 or --NR.sup.4 R.sup.5 in which R.sup.3 is a hydrogen atom, a straight-chain alkyl group, a cyclic alkyl group, an aryl group, an aralkyl group, a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.4 and R.sup.5, which may be the same or different, are hydrogen atoms, straight-chain alkyl groups, cyclic alkyl groups, aralkyl groups or aryl groups, and (B) a radiation-sensitive acid forming agent. Said radiation-sensitive composition can be suitably used as a resist composition which enables reliable fine processing, which has high sensitivity and high resolution degree, and which is superior in dry etching resistance, develop-ability, adhesiveness, heat resistance and yield of residual film thickness.

    摘要翻译： 一种辐射敏感性组合物，其包含（A）具有由式（1）表示的重复单元的聚合物：其中R1表示取代的甲基，取代的乙基，甲硅烷基，甲锗烷基或 烷氧基羰基，R 2表示-OR 3或-NR 4 R 5，其中R 3为氢原子，直链烷基，环烷基，芳基，芳烷基，取代甲基，取代乙基， 甲硅烷基，甲锗烷基或烷氧基羰基，R 4和R 5可以相同或不同，为氢原子，直链烷基，环烷基，芳烷基或芳基，（B）辐射 敏感性酸形成剂。 所述辐射敏感性组合物可以适当地用作能够进行可靠的精细加工的抗蚀剂组合物，其具有高灵敏度和高分辨度，并且其耐干蚀刻性，显影性，粘合性，耐热性和残留膜的产率优异 厚度。

    Radiation-sensitive resin composition
    3.
    发明授权
    Radiation-sensitive resin composition 有权
    辐射敏感树脂组合物

    公开(公告)号：US06506537B2

    公开(公告)日：2003-01-14

    申请号：US09878274

    申请日：2001-06-12

    申请人： Eiichi Kobayashi ,  Jun Numata ,  Mikio Yamachika ,  Masafumi Yamamoto

    发明人： Eiichi Kobayashi ,  Jun Numata ,  Mikio Yamachika ,  Masafumi Yamamoto

    IPC分类号： G03F7004

    CPC分类号： G03F7/0758 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive-type radiation-sensitive resin composition is provided. The composition includes: (A) a low-molecular compound comprising a compound having at least one amino group having one or two hydrogen atom(s) bonded to the nitrogen atom; at least one hydrogen atom the amino group has having been substituted with a t-butoxycarbonyl group; (B) a radiation-sensitive acid generator; and (C) a silicon-atom-containing resin comprising an alkali-insoluble or alkali-slightly-soluble resin having been protected with an acid-cleavable group; the resin being capable of turning soluble in alkali upon cleavage of the acid-cleavable group. This radiation-sensitive resin composition is effectively responsive to radiations of various types, has superior sensitivity and resolution and also a superior long-term storage stability, and is useful as a positive-type chemically amplified resist.

    摘要翻译： 提供正型辐射敏感性树脂组合物。 该组合物包括：（A）包含具有至少一个具有与氮原子键合的一个或两个氢原子的氨基的化合物的低分子化合物; 至少一个氢原子已经被叔丁氧基羰基取代;（B）辐射敏感性酸产生剂; 和（C）含有硅原子的树脂，其包含用酸可裂解基团保护的碱不溶性或碱 - 微溶性树脂; 该树脂在切割酸可分解基团时能够转变为碱溶性。该辐射敏感性树脂组合物对各种辐射有效响应，具有优异的灵敏度和分辨率，并且还具有优异的长期储存稳定性，并且 可用作正型化学放大抗蚀剂。

    Radiation sensitive resin composition
    5.
    发明授权
    Radiation sensitive resin composition 失效
    辐射敏感树脂组合物

    公开(公告)号：US5679495A

    公开(公告)日：1997-10-21

    申请号：US352848

    申请日：1994-12-02

    申请人： Mikio Yamachika ,  Eiichi Kobayashi ,  Toshiyuki Ota ,  Akira Tsuji

    发明人： Mikio Yamachika ,  Eiichi Kobayashi ,  Toshiyuki Ota ,  Akira Tsuji

    IPC分类号： G03F7/004 ,  G03F7/028 ,  G03F7/039 ,  H01L21/027 ,  G03F7/023

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/11 ,  Y10S430/111

    摘要： A radiation sensitive resin composition which comprises (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units represented by the general formulas (1) and (2) and a recurring unit which acts to reduce the solubility of the polymer in an alkali developer after the irradiation: ##STR1## wherein R.sup.1 represents a hydrogen atom or a methyl group and R.sup.2 represents a hydrogen atom or a methyl group. Said composition provides a chemically amplified positive resist which can give a fine pattern with a good pattern shape, and said resist is freed from volume shrinkage, peeling failure and adhesive failure, is excellent in dry etching resistance and effectively reacts with various radiations to give a good pattern shape which is excellent in photolithographic process stability, said pattern shape having no thinned portion at the upper part.

    摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）在酸存在下变为碱溶性的聚合物和（B）辐射敏感的酸产生剂，其在辐射时产生酸，所述聚合物（A）包含两个重复 由通式（1）和（2）表示的单元和反应单元，其用于降低聚合物在照射后的碱显影剂中的溶解度：其中R1表示 氢原子或甲基，R 2表示氢原子或甲基。 所述组合物提供化学放大的正性抗蚀剂，其可以产生具有良好图案形状的精细图案，并且所述抗蚀剂没有体积收缩，剥离破坏和粘合剂破坏，具有优异的耐干蚀刻性，并且与各种辐射有效反应以产生 良好的图案形状，其光刻工艺稳定性优异，所述图案形状在上部没有变薄部分。

    Radiation sensitive resin composition
    6.
    再颁专利
    Radiation sensitive resin composition 有权
    辐射敏感树脂组合物

    公开(公告)号：USRE37179E1

    公开(公告)日：2001-05-15

    申请号：US09420604

    申请日：1999-10-21

    申请人： Mikio Yamachika ,  Eiichi Kobayashi ,  Akira Tsuji ,  Toshiyuki Ota

    发明人： Mikio Yamachika ,  Eiichi Kobayashi ,  Akira Tsuji ,  Toshiyuki Ota

    IPC分类号： G03F7023

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/11 ,  Y10S430/111

    摘要： A radiation sensitive resin composition which comprises (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units represented by the general formulas (1) and (2) and a recurring unit which acts to reduce the solubility of the polymer is an alkali developer after the irradiation: wherein R1 represents a hydrogen atom or a methyl group and R2 represents a hydrogen atom or a methyl group. Said composition provides a chemically amplified positive resist which can give a fine pattern with a good pattern shape, and said resist is freed from volume shrinkage, peeling failure and adhesive failure, is excellent in dry etching resistance and effectively reacts with various radiations to give a good pattern shape which is excellent in photolithographic process stability, said pattern shape having no thinned portion at the upper part.

    摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）在酸存在下变为碱溶性的聚合物和（B）辐射敏感的酸产生剂，其在辐射时产生酸，所述聚合物（A）包含两个重复 由通式（1）和（2）表示的单元和降低聚合物溶解度的重复单元是照射后的碱显影剂：其中R1表示氢原子或甲基，R2表示氢原子 或甲基。 所述组合物提供化学放大的正性抗蚀剂，其可以产生具有良好图案形状的精细图案，并且所述抗蚀剂没有体积收缩，剥离破坏和粘合剂破坏，具有优异的耐干蚀刻性，并且与各种辐射有效反应以产生 良好的图案形状，其光刻工艺稳定性优异，所述图案形状在上部没有变薄部分。