Group III-nitride based resonant cavity light emitting devices fabricated on single crystal gallium nitride substrates
    9.
    发明申请
    Group III-nitride based resonant cavity light emitting devices fabricated on single crystal gallium nitride substrates 有权
    在单晶氮化镓衬底上制造的III族氮化物基谐振腔发光器件

    公开(公告)号:US20050087753A1

    公开(公告)日:2005-04-28

    申请号:US10693803

    申请日:2003-10-24

    摘要: In a method for producing a resonant cavity light emitting device, a seed gallium nitride crystal (14) and a source material (30) are arranged in a nitrogen-containing superheated fluid (44) disposed in a sealed container (10) disposed in a multiple-zone furnace (50). Gallium nitride material is grown on the seed gallium nitride crystal (14) to produce a single-crystal gallium nitride substrate (106, 106′). Said growing includes applying a temporally varying thermal gradient (100, 100′, 102, 102′) between the seed gallium nitride crystal (14) and the source material (30) to produce an increasing growth rate during at least a portion of the growing. A stack of group III-nitride layers (112) is deposited on the single-crystal gallium nitride substrate (106, 106′), including a first mirror sub-stack (116) and an active region (120) adapted for fabrication into one or more resonant cavity light emitting devices (108, 150, 160, 170, 180).

    摘要翻译: 在制造谐振腔发光器件的方法中,将氮化镓晶体(14)和源极材料(30)布置在设置在密封容器(10)中的含氮过热流体(44)中, 多区炉(50)。 在氮化镓晶体(14)上生长氮化镓材料以制造单晶氮化镓衬底(106,106')。 所述生长包括在种子氮化镓晶体(14)和源材料(30)之间施加时间上不同的热梯度(100,100',102,102'),以在至少一部分生长期间产生增加的生长速率 。 一组III族氮化物层(112)沉积在单晶氮化镓衬底(106,106')上,其包括第一反射镜子层(116)和适于制造成一体的有源区(120) 或更多的谐振腔发光器件(108,150,160,170,180)。